Electron beam evaporator BESTEC (EVAPORATOR)


Guarantor:
Jan Prášek, Ph.D.

Instrument status:
Operational Operational, 7.5.2024 15:10

Equipment placement:
CEITEC Nano - C1.36


The UHV physical vapor deposition system for thin-film e-beam deposition (mostly metals). A carousel for eight different materials, substrate rotation, and tilting is available.


Publications:

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Photogallery

Specification

Substrate temperature RT – 900 °C
8 materialsplease check the Logbook for current materials inside the Evaporator
LoadlockYES
Sample size up to 7 × 7”
Rotation of substrateYES
Tilt of substrate holder up to 45°
Electron source up to 10 kW

Standard materials

Au, Ag, Al, Ti, Cr, Co, Cu, Ni, Fe, VO2, SiO2, Cr2O3, NiFe, NiCr, Co60Fe20B20
Additional cost - Au

​Self-service users have 20 nm of Au for free - everything above is 15 CZK/nm

Full-service cost is 15 CZK/nm for academic and 20 CZK/nm for commercial projects

Documents

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