Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD-FIJI)

Profile card (PDF)

Atomic Layer Deposition is a deposition technique for very thin layers with the thickness control down to a single atomic layer. It belongs to the CVD techniques family. The thickness precision is achieved by pulsed deposition, where first a metal-containing precursor is introduced into the chamber and after a short time (allowing for monolayer adsorption) the chamber is pumped down. The following step is exposure to the oxidizing precursor (for oxides) or nitrogen-containing precursor (for nitrides). Thus, a monolayer of the target material is grown. The metal-containing precursors are usually organometallic ones, for oxidation a water or oxygen plasma can be used, nitridation is done using nitrogen plasma. To achieve the deposition in the ALD mode, the sample is heated up to a certain temperature, for most processes being in the range from 150 to 300 °C.

Publications:

• ČERVINKA, O.; WEISS, V.; HRTOŇ, M.; BOUCHAL, P.; LIŠKA, P.; LIGMAJER, F.; ŠIKOLA, T.; VIEWEGH, P., 2026: Establishing a library of metasurface building blocks through coherence-controlled holographic microscopy. JOURNAL OF APPLIED PHYSICS 139(5), doi: 10.1063/5.0303155; FULL TEXT
  (RAITH, EVAPORATOR, ALD-FIJI, SCIA, DIENER)
• THALLURI, S.; RODRIGUEZ PEREIRA, J.; MICHALIČKA, J.; KOLÍBALOVÁ, E.; HROMÁDKO, L.; ŠLANG, S.; POUZAR, M.; SOPHA, H.; ZAZPE MENDIOROZ, R.; MACÁK, J., 2025: Enhancing Alkaline Hydrogen Evolution Reaction on Ru-Decorated TiO2 Nanotube Layers: Synergistic Role of Ti3+, Ru Single Atoms, and Ru Nanoparticles. ENERGY & ENVIRONMENTAL MATERIALS , p. 1 - 8, doi: 10.1002/eem2.12864; FULL TEXT
  (TITAN, LYRA, RIGAKU3, ALD-FIJI, KRATOS-XPS)
• Bawab, B.; Rodriguez-Pereira, J.; Michalicka, J.; Pouzar, M.; Hromadko, L.; Zazpe, R.; Macak, JM., 2025: Atomic layer deposited Ir nanostructures on titania nanotube layers for efficient alkaline hydrogen evolution reaction. ELECTROCHIMICA ACTA 535, doi: 10.1016/j.electacta.2025.146607; FULL TEXT
  (ALD-FIJI, TITAN)
• KEPIČ, P.; LIŠKA, P.; IDESOVÁ, B.; CAHA, O.; LIGMAJER, F.; ŠIKOLA, T., 2024: . NEW JOURNAL OF PHYSICS 26(1), p. 1 - 8, doi: 10.1088/1367-2630/ad1696; FULL TEXT
  (ICON-SPM, LYRA, ALD-FIJI, WITEC-RAMAN, RIGAKU9, WOOLLAM-VIS, KRATOS-XPS)
• BAWAB, B.; THALLURI, S.; KOLÍBALOVÁ, E.; ZAZPE MENDIOROZ, R.; JELÍNEK, L.; RODRIGUEZ PEREIRA, J.; MACÁK, J., 2024: . CHEMICAL ENGINEERING JOURNAL 482, p. 1 - 9, doi: 10.1016/j.cej.2024.148959; FULL TEXT
  (ALD-FIJI, VERIOS, TITAN, RIGAKU3, KRATOS-XPS)

• DESHMUKH, S.; GAO, W.; MICHALIČKA, J.; PUMERA, M., 2024: . CHEMICAL ENGINEERING JOURNAL 480, doi: 10.1016/j.cej.2023.147895; FULL TEXT
  (ALD-FIJI, RIGAKU3, TITAN, WITEC-RAMAN, KRATOS-XPS)
• Kunc, J.; Fridrišek, T.; Shestopalov, M.; Jo, J.; Park, K., 2024: . AIP ADVANCES 14(9), p. 1 - 9, doi: 10.1063/5.0223763; FULL TEXT
  (RAITH, RIE-FLUORINE, ALD-FIJI, EVAPORATOR, WIRE-BONDER, KRATOS-XPS)
• Henrotte, O.; Kment, Š.; Naldoni, A., 2024: . NANO LETTERS 24(29), p. 8851 - 8858, doi: 10.1021/acs.nanolett.4c01386; FULL TEXT
  (ALD-FIJI)
• AIGNER, A.; LIGMAJER, F.; ROVENSKÁ, K.; HOLOBRÁDEK, J.; IDESOVÁ, B.; MAIER, S.; TITTL, A.; MENEZES, L., 2024: . NANO LETTERS 24(35), p. 10742 - 8, doi: 10.1021/acs.nanolett.4c01703; FULL TEXT
  (KAUFMAN, ALD-FIJI, EVAPORATOR)
• KOVAŘÍK, M.; CITTERBERG, D.; PAIVA DE ARAÚJO, E.; ŠIKOLA, T.; KOLÍBAL, M., 2024: . ACS APPLIED ELECTRONIC MATERIALS 6(12), p. 8776 - 7, doi: 10.1021/acsaelm.4c01450; FULL TEXT
  (ALD-FIJI, MIRA-EBL, EVAPORATOR, MPS150, KEITHLEY-4200, LYRA, LITESCOPE-LYRA, WITEC-RAMAN, WIRE-BONDER, NANOSCAN)
• Baishya, K.; Bacova, J.; Al Chimali, B.; Capek, J.; Michalicka, J.; Gautier, G.; Le Borgne, B.; Rousar, T. ; Macak, JM., 2024: . ACS APPLIED MATERIALS & INTERFACES 17(1), p. 739 - 11, doi: 10.1021/acsami.4c19142; FULL TEXT
  (TITAN, RIGAKU9, ALD-FIJI, VERIOS, ICON-SPM, KRATOS-XPS)
• GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: . PHYSICAL REVIEW B 107(12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144; FULL TEXT
  (ALD-FIJI, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, WOOLLAM-MIR, ICON-SPM)
• WOJEWODA, O.; LIGMAJER, F.; HRTOŇ, M.; KLÍMA, J.; DHANKHAR, M.; DAVÍDKOVÁ, K.; STAŇO, M.; HOLOBRÁDEK, J.; KRČMA, J.; ZLÁMAL, J.; ŠIKOLA, T.; URBÁNEK, M., 2023: . COMMUNICATIONS PHYSICS 6(1), p. 1 - 10, doi: 10.1038/s42005-023-01214-z; FULL TEXT
  (RAITH, MIRA-EBL, EVAPORATOR, MAGNETRON, ALD-FIJI, LYRA, ICON-SPM, BRILLOUIN)
• GAO, W.; PERALES RONDON, J.; MICHALIČKA, J.; PUMERA, M., 2023: . APPLIED CATALYSIS B: ENVIRONMENTAL 330, doi: 10.1016/j.apcatb.2023.122632; FULL TEXT
  (ALD-FIJI, VERIOS, LYRA, TITAN, JASCO, KRATOS-XPS)
• HEMZAL, D.; PRÁŠEK, J.; HRDÝ, R.; DRBOHLAVOVÁ, J.; KOPP, R., 2023: . JOURNAL OF RAMAN SPECTROSCOPY , p. 1074 - 10, doi: 10.1002/jrs.6587; FULL TEXT
  (EVAPORATOR, ALD-FIJI)
• Henrotte, O.; Kment, Š.; Naldoni, A., 2023: . JOURNAL OF PHYSICAL CHEMISTRY C 127(32), p. 15861 - 15870, doi: 10.1021/acs.jpcc.3c04176; FULL TEXT
  (ALD-FIJI)
• NG, S.; SANNA, M.; REDONDO NEGRETE, E.; PUMERA, M., 2023: . JOURNAL OF MATERIALS CHEMISTRY A 12(1), p. 396 - 9, doi: 10.1039/d3ta04460b; FULL TEXT
  (ALD-FIJI, VERIOS, KRATOS-XPS)
• ROVENSKÁ, K.; LIGMAJER, F.; IDESOVÁ, B.; KEPIČ, P.; LIŠKA, J.; CHOCHOL, J.; ŠIKOLA, T., 2023: . OPTICS EXPRESS 31(26), p. 43048 - 9, doi: 10.1364/OE.506069; FULL TEXT
  (EVAPORATOR, MIRA-EBL, RIE-CHLORINE, ALD-FIJI, SNOM-NANONICS, TUBE-FURNACE)
• Idesová, B., 2023: . MASTER'S THESIS , p. 1 - 71; FULL TEXT
  (EVAPORATOR, ALD-FIJI, RAITH, NANOCALC, SCIA)
• GAO, W.; MICHALIČKA, J.; PUMERA, M., 2022: . SMALL 18(1), p. 2105572-1 - 13, doi: 10.1002/smll.202105572; FULL TEXT
  (ALD-FIJI, VERIOS, MIRA-STAN, TITAN, RIGAKU3, KRATOS-XPS)
• WANG, L.; NG, S.; JYOTI, J.; PUMERA, M., 2022: . ACS APPLIED NANO MATERIALS 5(7), p. 9719 - 9, doi: 10.1021/acsanm.2c01937; FULL TEXT
  (ALD-FIJI, VERIOS, KRATOS-XPS)
• Sreedhara, MB.; Bukvisova, K.; Khadiev, A.; Citterberg, D.; Cohen, H.; Balema, V.; Pathak, AK.; Novikov, D.; Leitus, G.; Kaplan-Ashiri, I.; Kolibal, M.; Enyashin, AN.; Houben, L.; Tenne, R., 2022: . CHEMISTRY OF MATERIALS 34(4), p. 1838 - 16, doi: 10.1021/acs.chemmater.1c04106; FULL TEXT
  (TITAN, HELIOS, RAITH, EVAPORATOR, MPS150, KEITHLEY-4200, ALD-FIJI)
• KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: . MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664; FULL TEXT
  (ALD-FIJI, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
• NG, S.; IFFELSBERGER, C.; MICHALIČKA, J.; PUMERA, M., 2021: . ACS NANO 15(1), p. 686 - 12, doi: 10.1021/acsnano.0c06961; FULL TEXT
  (TITAN, ALD-FIJI, VERIOS, KRATOS-XPS)
• Dhankhar, M.;, 2021: . PH.D. THESIS , p. 1 - 100; FULL TEXT
  (KERR-MICROSCOPE, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD-FIJI, WIRE-BONDER, SUSS-RCD8, ICON-SPM)
• KAUSHIK, P.; ELIÁŠ, M.; PRÁŠEK, J.; MICHALIČKA, J.; ZAJÍČKOVÁ, L., 2021: . MATERIALS CHEMISTRY AND PHYSICS 271, p. 124901-1 - 11, doi: 10.1016/j.matchemphys.2021.124901; FULL TEXT
  (EVAPORATOR, PECVD-NANOFAB, DIENER, ALD-FIJI, RIGAKU9, VERIOS, TITAN)
• Dallaev, R., 2021: . VACUUM 193, doi: 10.1016/j.vacuum.2021.110533; FULL TEXT
  (ALD-FIJI, SIMS, ICON-SPM)
• Burda, D.; Allaham, M.M.; Knapek, A.; Sobola, D.; Mousa, M.S., 2021: . INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE , p. 178 - 179, doi: 10.1109/IVNC52431.2021.9600704; FULL TEXT
  (ALD-FIJI)
• Pejchal, T., 2021: . PH.D. THESIS ; FULL TEXT
  (NANOSAM, WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, VERIOS, HELIOS, TITAN, ALD-FIJI, EVAPORATOR, MIRA-EBL, MPS150, KRATOS-XPS)
• Chmela, O., 2020: . PH.D THESIS , p. 1 - 199
  (ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, NANOCALC, MPS150, WIRE-BONDER, ICON-SPM)
• Rovenská, K., 2020: . MASTER'S THESIS , p. 1 - 57
  (MAGNETRON, DEKTAK, MIRA-EBL, EVAPORATOR, VERIOS, RIE-FLUORINE, ALD-FIJI, KRATOS-XPS)
• KAUSHIK, P.; ELIÁŠ, M.; MICHALIČKA, J.; HEGEMANN, D.; PYTLÍČEK, Z.; NEČAS, D.; ZAJÍČKOVÁ, L., 2019: . SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 9, doi: 10.1016/j.surfcoat.2019.04.031; FULL TEXT
  (ALD-FIJI, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, VERIOS, TITAN, RIGAKU3, KRATOS-XPS)
• Fecko, P., 2019: . MASTER'S THESIS , p. 1 - 52
  (SUSS-RCD8, SUSS-MA8, DWL, DRIE, ALD-FIJI, RIE-FLUORINE, PARYLENE-SCS, XEF2, LYRA, ICON-SPM)
• HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: . INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 4, doi: 10.1109/ISSE.2019.8810156; FULL TEXT
  (ALD-FIJI, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
• Pokorný, D., 2019: . MASTER'S THESIS , p. 1 - 71
  (WOOLLAM-VIS, ALD-FIJI, KRATOS-XPS)
• Vida, J., 2019: . MASTER'S THESIS , p. 1 - 50
  (ALD-FIJI, WOOLLAM-VIS, VUVAS, EVAPORATOR, SUSS-MA8, SUMMIT, RIGAKU3, KRATOS-XPS)
• Konečný, A., 2019: . BACHELOR'S THESIS , p. 1 - 32; FULL TEXT
  (MAGNETRON, PECVD, ALD-FIJI, WOOLLAM-MIR)
• Procházka, P., 2018: . PH.D. THESIS , p. 1 - 139
  (ALD-FIJI, DIENER, EVAPORATOR, MIRA-EBL, PECVD, WIRE-BONDER)
• STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: . NANOSCALE 10(37), p. 17520 - 5, doi: 10.1039/c8nr06483k; FULL TEXT
  (ALD-FIJI, DIENER, DWL, EVAPORATOR)
• Vančík, S., 2018: . MASTER'S THESIS , p. 1 - 68
  (DWL, ALD-FIJI, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE)
• Kaushik, P.; Elias, M.; Prasek, J.; Pytlicek, Z.; Zajickova, L., 2018: . ELECTRONICS TECHNOLOGY (ISSE) , p. 959 - 961
  (ALD-FIJI, LYRA)
• PROCHÁZKA, P.; MAREČEK, D.; LIŠKOVÁ, Z.; ČECHAL, J.; ŠIKOLA, T., 2017: . SCIENTIFIC REPORTS 7, p. 1 - 7, doi: 10.1038/s41598-017-00673-z; FULL TEXT
  (MIRA-EBL, DIENER, ALD-FIJI, WIRE-BONDER)
• Xiao, N.;Villena, M.A.; Yuan, B.; Chen, S.; Wang, B.; Eliáš, M.; Shi, Y.; Hui, F.; Jing, X.; Scheuermann, A.; Tang, K.; McIntyre, P.C., 2017: . ADVANCED FUNCTIONAL MATERIALS 27(33), p. 859 - 7, doi: 10.1002/adfm.201700384; FULL TEXT
  (ALD-FIJI)
• Musálek, T., 2016: . MASTER’S THESIS , p. 1 - 52
  (UHV-MBE, VERIOS, MIRA-EBL, ALD-FIJI, LYRA)
• Andrýsek, M., 2016: . BACHELOR’S THESIS , p. 1 - 22
  (VERIOS, ALD-FIJI, LYRA)
• Lišková, Z., 2015: . PH.D. THESIS , p. 1 - 106
  (MIRA-EBL, DIENER, NANOCALC, DWL, EVAPORATOR, WIRE-BONDER, ALD-FIJI, LYRA)
• Švarc, V., 2015: . MASTER'S THESIS , p. 1 - 50
  (ALD-FIJI, DIENER, WIRE-BONDER, LYRA)