Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
Guarantor:
Vojtěch Švarc, Ph.D.
Instrument status:
Operational, 27.5.2025 12:45, Theta TSA axis in the state of observation
Equipment placement:
CEITEC Nano - C1.30
The Süss MicroTec MA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top side optical microscopes and bottom side microscopes, so alignment is possible from both sides of the wafer.
Publications:
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MIGLIACCIO, L.; SAY, M.; PATHAK, G.; GABLECH, I.; BRODSKÝ, J.; DONAHUE, M.; GLOWACKI, E., 2025: Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte-Gated Transistors for Bioelectronics. ADVANCED MATERIALS TECHNOLOGIES , p. 2302219 - 9, doi: 10.1002/admt.202302219; FULL TEXT
(SUSS-MA8, RIE-FLUORINE, PARYLENE-DIENER, KEITHLEY-4200) -
Horký, M., 2025: . PH.D. THESIS , p. 1 - 181; FULL TEXT
(RAITH, MIRA-EBL, LYRA, TEGRAMIN, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, UHV-PREPARATION, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9) -
Brodský, J.; Liu, X.; Jarušek, J.; Migliaccio, L.; Neužil, P.; Zítka, O.; Gablech, I., 2025: . SENSORS AND ACTUATORS A: PHYSICAL 392, p. 1 - 6, doi: 10.1016/j.sna.2025.116719; FULL TEXT
(SUSS-MA8, RIE-FLUORINE, DRIE) -
SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7(13), p. 5889 - 5897, doi: 10.1021/acsaelm.5c00351; FULL TEXT
(DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA) -
TAKHSHA, M.; SINGH, V.; LEDIEU, J.; FABBRICI, S.; CASOLI, F.; MEZZADRI, F.; HORKÝ, M.; FOURNEE, V.; UHLÍŘ, V.; ALBERTINI, F., 2025: Magnetic Manipulation of Spatially Confined Multiferroic Heuslers by Martensitic Microstructure Engineering. SMALL STRUCTURES 6(11), p. 1 - 12, doi: 10.1002/sstr.202500284; FULL TEXT
(VERIOS, VERSALAB, SUSS-MA8, RIE-FLUORINE, KERR-MICROSCOPE)
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Liu, X.; Brodský, J.; Vírostko, J.; Jarušek, J.; Migliaccio, L.; Zítka, O.; Gablech, I.; Neužil, P., 2025: . SCIENTIFIC REPORTS 15(1), doi: 10.1038/s41598-025-24442-5; FULL TEXT
(DRIE, SUSS-MA8, RIE-FLUORINE) -
Děcký, M., 2025: . MASTER'S THESIS , p. 1 - 63; FULL TEXT
(MIRA-EBL, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, MPS150, LYRA, LASER-DICER) -
JAKEŠOVÁ, M.; KUNOVSKÝ, O.; GABLECH, I.; KHODAGHOLY, D.; GELINAS, J.; GLOWACKI, E., 2024: . JOURNAL OF NEURAL ENGINEERING 21(4), doi: 10.1088/1741-2552/ad593d; FULL TEXT
(PARYLENE-SCS, MAGNETRON, SUSS-MA8, EVAPORATOR, RIE-FLUORINE, DIENER, WIRE-BONDER) -
GRYSZEL, M.; JAKEŠOVÁ, M.; VU, X.; INGEBRANDT, S.; GLOWACKI, E., 2024: . ADVANCED HEALTHCARE MATERIALS , doi: 10.1002/adhm.202302400; FULL TEXT
(EVAPORATOR, DEKTAK, RIE-FLUORINE, DWL, SUSS-MA8) -
NOWAKOWSKA, M.; JAKEŠOVÁ, M.; SCHMIDT, T.; OPANČAR, A.; POLZ, M.; REIMER, R.; FUCHS, J.; PATZ, S.; ZIESEL, D.; SCHERUEBEL, S.; KORNMUELLER, K.; RIENMÜLLER, T.; DEREK, V.; GLOWACKI, E.; SCHINDL, R.; ÜÇAL, M., 2024: . ADVANCED HEALTHCARE MATERIALS 13(29), p. 1 - 19, doi: 10.1002/adhm.202401303; FULL TEXT
(DWL, SUSS-MA8) -
CHMELÍKOVÁ, L.; FECKO, P.; CHMELÍK, J.; SKÁCEL, J.; OTÁHAL, A.; FOHLEROVÁ, Z., 2023: . APPLIED MATERIALS TODAY , p. 1 - 12, doi: 10.1016/j.apmt.2023.101736; FULL TEXT
(DRIE, PARYLENE-SCS, SUSS-MA8, XEF2) -
KAMNEV, K.; PYTLÍČEK, Z.; BENDOVÁ, M.; PRÁŠEK, J.; GISPERT-GUIRADO, F.; LLOBET, E.; MOZALEV, A., 2023: . SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 24(1), p. 1 - 17, doi: 10.1080/14686996.2022.2162324; FULL TEXT
(MAGNETRON, SUSS-MA8, SUSS-RCD8, VERIOS, MPS150, KRATOS-XPS) -
BRODSKÝ, J.; GABLECH, I.; MIGLIACCIO, L.; HAVLÍČEK, M.; DONAHUE, M.; GLOWACKI, E., 2023: . ACS APPL MATER INTER 15(22), p. 27002 - 8, doi: 10.1021/acsami.3c02049; FULL TEXT
(SUSS-MA8, EVAPORATOR, SCIA, PARYLENE-SCS, RIE-FLUORINE, MIRA-EBL, DEKTAK, ICON-SPM) -
ABUDLLAEVA, O.; SAHALIANOV, I.; EJNEBY, M.; JAKEŠOVÁ, M.; ZOZOULENKO, I.; LIIN, S.; GLOWACKI, E., 2022: . ADVANCED SCIENCE , p. 1 - 14, doi: 10.1002/advs.202103132; FULL TEXT
(DIENER, EVAPORATOR, SUSS-MA8, PARYLENE-SCS, RIE-FLUORINE) -
GABLECH, I.; BRODSKÝ, J.; VYROUBAL, P.; PIASTEK, J.; BARTOŠÍK, M.; PEKÁREK, J., 2022: . JOURNAL OF MATERIALS SCIENCE 57(3), p. 1923 - 13, doi: 10.1007/s10853-021-06846-6; FULL TEXT
(RIE-FLUORINE, DRIE, EVAPORATOR, WIRE-BONDER, WITEC-RAMAN, MPS150, KEITHLEY-4200, SUSS-MA8, DWL) -
Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: . JOURNAL OF LOW TEMPERATURE PHYSICS , doi: 10.1007/s10909-022-02675-2; FULL TEXT
(PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA) -
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: . MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664; FULL TEXT
(ALD-FIJI, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS) -
Gaňová, M., 2022: . PH.D. THESIS , p. 1 - 92; FULL TEXT
(SUSS-MA8, SUSS-RCD8, PARYLENE-SCS) -
GHAHFAROKHI, M.; ARREGI URIBEETXEBARRIA, J.; CASOLI, F.; HORKÝ, M.; CABASSI, R.; UHLÍŘ, V.; ALBERTINI, F., 2021: . APPLIED MATERIALS TODAY 23, p. 101058-1 - 11, doi: 10.1016/j.apmt.2021.101058; FULL TEXT
(VERSALAB, RIGAKU9, KERR-MICROSCOPE, SUSS-MA8, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, VERIOS) -
Brodský J., 2021: . MASTER'S THESIS , p. 1 - 84; FULL TEXT
(DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, WITEC-RAMAN, RIE-FLUORINE, DRIE, LYRA, ICON-SPM) -
GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: . MICROMACHINES 11(4), p. 365 - 7, doi: 10.3390/mi11040365; FULL TEXT
(EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8) -
Chmela, O., 2020: . PH.D THESIS , p. 1 - 199
(ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, NANOCALC, MPS150, WIRE-BONDER, ICON-SPM) -
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: . JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38(6), p. 38 - 6, doi: 10.1116/6.0000558; FULL TEXT
(SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA) -
Brodský, J., 2019: . BACHELOR'S THESIS , p. 1 - 50
(MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA) -
Fecko, P., 2019: . MASTER'S THESIS , p. 1 - 52
(SUSS-RCD8, SUSS-MA8, DWL, DRIE, ALD-FIJI, RIE-FLUORINE, PARYLENE-SCS, XEF2, LYRA, ICON-SPM) -
Vida, J., 2019: . MASTER'S THESIS , p. 1 - 50
(ALD-FIJI, WOOLLAM-VIS, VUVAS, EVAPORATOR, SUSS-MA8, SUMMIT, RIGAKU3, KRATOS-XPS) -
GABLECH, I.; KLEMPA, J.; PEKÁREK, J.; VYROUBAL, P.; KUNZ, J.; NEUŽIL, P., 2019: . 2019 19TH INTERNATIONAL CONFERENCE ON MICRO AND NANOTECHNOLOGY FOR POWER GENERATION AND ENERGY CONVERSION APPLICATIONS (POWERMEMS) (001), p. 1 - 4, doi: 10.1109/PowerMEMS49317.2019.82063211368; FULL TEXT
(DIENER, DRIE, DWL, KAUFMAN, RIE-CHLORINE, SUSS-MA8) -
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: . INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 4, doi: 10.1109/ISSE.2019.8810156; FULL TEXT
(ALD-FIJI, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE) -
PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: . INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 6, doi: 10.1109/ISSE.2019.8810293; FULL TEXT
(DRIE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, ICON-SPM) -
PODEŠVA, P.; GABLECH, I.; NEUŽIL, P., 2018: . ANALYTICAL CHEMISTRY 90(2), p. 1161 - 7, doi: 10.1021/acs.analchem.7b0372; FULL TEXT
(SUSS-MA8, DWL, SCIA, DIENER) -
GABLECH, I.; SOMER, J.; FOHLEROVÁ, Z.; SVATOŠ, V.; PEKÁREK, J.; KURDÍK, S.; FENG, J.; FECKO, P.; PODEŠVA, P.; HUBÁLEK, J.; NEUŽIL, P., 2018: . MICROFLUIDICS AND NANOFLUIDICS 22(9), p. NA - 7, doi: 10.1007/s10404-018-2125-6; FULL TEXT
(DRIE, DWL, SUSS-MA8, PARYLENE-SCS, XEF2) -
Vančík, S., 2018: . MASTER'S THESIS , p. 1 - 68
(DWL, ALD-FIJI, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE) -
Pekárek, J.; Prokop, R.; Svatoš, V.; Gablech, I.; Hubálek, J.; Neužil, P., 2017: . SENSORS AND ACTUATORS, A: PHYSICAL 265, p. 40 - 46, doi: 10.1016/j.sna.2017.08.025
(SUSS-MA8, EVAPORATOR, RIE-FLUORINE, SUMMIT, SCIA)
Photogallery
Specification
Mask and Wafer/Substrate
| Wafer Size: | 1” – 200 mm |
|---|---|
| Max. substrate size: | 200 x 200 mm |
| Min. Pieces: | 5 x 5 mm |
| Wafer Thickness: | max. 10 mm |
| Mask Size: | standard 2” x 2” up to 9” x 9” (SEMI) |
Exposure Modes
| Contact: | soft, hard, vacuum |
|---|---|
| Proximity: | exposure gap 1–300 mm |
| Gap setting accuracy: | 1 µm |
| Modes: | constant power, constant dose |
| Options: | Flood exposure |
Exposure Optics
| Resolution: |
1,5 µm (vacuum); 2 µm (hard); 3 µm (soft); 3,5 µm (proximity 20 µm) |
|---|---|
| Wavelength range: |
UV400 350–450 nm
|
| Exposure source: |
Hg lamp 1000 W
|
| Intensity uniformity: | less than 3,5 % (200 mm) |
Alignment methods
| Top Side Alignment (TSA): | accuracy less than 0,5 µm (with assisted alignment & SUSS MicroTec recommended wafer targets) |
|---|---|
| Bottom Side Alignment (BSA): | accuracy less than 1 µm |
| TSA Focus Range: | 1–400 µm (AL400 – motorized focus and image capturing) |
Alignment stage
| MA Movement Range: | X: +/- 5mm; Y: +/- 5 mm; Theta +/- 5° |
|---|---|
| Resolution: | 0,1 µm |
Topside Microscope (TSA)
| Movement Range: | X: 33–202 mm; Y: +18, -100 mm; Theta: +/- 5° |
|---|
Bottomside Microscope (BSA)
| Movement Range: | X: 20–210 mm; Y: +/- 22 mm; focus 6 mm |
|---|
Documents
Here is place for your documents.
+420 54114 9207
nano@ceitec.vutbr.cz
