High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab (PECVD-NANOFAB)

Chemical vapour deposition system going to very high deposition temperatures dedicated to the deposition of carbon nanomaterials, possibilities of plasma enhancement by discharges of different frequency (including their regular switching).

Publications:

• ROY, R.; NEČAS, D.; ZAJÍČKOVÁ, L., 2021: . CARBON 179, p. 677 - 6, doi: 10.1016/j.carbon.2021.04.086; FULL TEXT
  (PECVD-NANOFAB, WITEC-RAMAN, ICON-SPM)
• Polzer, A.; Sedlak, J.; Sedlacek, J.; Benes, L.; Mouralova, K., 2021: . COATINGS 11(9), doi: 10.3390/coatings11091108; FULL TEXT
  (PECVD-NANOFAB, TITAN, HELIOS, ICON-SPM)
• KAUSHIK, P.; ELIÁŠ, M.; PRÁŠEK, J.; MICHALIČKA, J.; ZAJÍČKOVÁ, L., 2021: . MATERIALS CHEMISTRY AND PHYSICS 271, p. 124901-1 - 11, doi: 10.1016/j.matchemphys.2021.124901; FULL TEXT
  (EVAPORATOR, PECVD-NANOFAB, DIENER, ALD-FIJI, RIGAKU9, VERIOS, TITAN)
• Michal, L., 2020: . MASTER'S THESIS , p. 1 - 54; FULL TEXT
  (PECVD-NANOFAB, WITEC-RAMAN, KRATOS-XPS)
• KAUSHIK, P.; ELIÁŠ, M.; MICHALIČKA, J.; HEGEMANN, D.; PYTLÍČEK, Z.; NEČAS, D.; ZAJÍČKOVÁ, L., 2019: . SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 9, doi: 10.1016/j.surfcoat.2019.04.031; FULL TEXT
  (ALD-FIJI, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, VERIOS, TITAN, RIGAKU3, KRATOS-XPS)

• Mouralova, K.; Zahradnicek, R.; Bednar, J., 2019: . DIAMOND AND RELATED MATERIALS 97, p. 107439-1 - 107439-7, doi: 10.1016/j.diamond.2019.107439
  (EVAPORATOR, PECVD-NANOFAB, VERIOS, HELIOS, TITAN, ICON-SPM)