Services for commercial users

Access for self-service commercial users

Commercial users typically order measurement/nanofabrication services and their samples are processed by CEITEC Nano staff. They can be present at the measurement as visitors under the supervision of authorized personnel.

If required, self-service access to all CEITEC Nano equipment is available also to commercial users. Commercial users pay a User fee (30,000 CZK/year) plus they pay an hourly charge which includes full instrument running costs, instrument depreciation and CEITEC Nano training and processing fees. See full CEITEC Nano price list.

Please contact us at nano@ceitec.vutbr.cz to discuss your individual needs and pricing.

Commercial users

   

       

                                                    


How to order commercial full-service

Contact the CEITEC Nano User Office at nano@ceitec.vutbr.cz or via phone at +420 54114 9200 to discuss your processing requirements.
The CEITEC Nano financial department will send you a quotation for CEITEC Nano services. If you have any questions regarding invoicing, contact CEITEC Nano financial manager Kateřina Tydlačková (+420 51118 1252, katerina.tydlackova@ceitec.vutbr.cz) with your questions.
If you agree with the quotation, send the purchase order to nano@ceitec.vutbr.cz
CEITEC Nano staff will process your samples and prepare a processing/measurement report.
Upon agreement, an invoice will be emailed to you together with the samples or measurement data.

Prices for commercial users

Valid from 1st April 2023.
The prices include full instrument running costs, operator’s wage, instrument depreciation and CEITEC Nano processing fee. Contact CEITEC Nano User Office at nano@ceitec.vutbr.cz for a quotation.

CEITEC Nano pricelist* - full service for Commercial users






Nanofabrication Laboratory




Lithography

CZK/hourEUR/hour
RAITHE-beam writer RAITH150 Two3 800160
MIRAScanning Electron Microscope/E-beam writer TESCAN MIRA33 400140
DWLUV Direct Write Laser system Heidelberg Instruments DWL 66-fs2 800115
SUSS-MA8Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen33 900165
SUSS-WETBENCHLithographic wetbench for resist coating SÜSS MicroTec3 400145
SUSS-RCD8Resist coating and development system SÜSS MicroTec RCD83 200135
LAURELLSpincoater Laurell WS-650-23B3 400145
NANOCALCSpectroscopic reflectometer Ocean Optics NanoCalc 20002 600110
DEKTAKMechanical profilometer Bruker Dektak XT2 900120
DIENERResist stripper Diener electronic NANO Plasma cleaner2 600110
FUMEHOODFumehoods for organic solvents and Fumehoods for corrosive liquids2 600110





Depositions and etching

CZK/hourEUR/hour
EVAPORATORElectron beam evaporator BESTEC4 300**180**
MAGNETRONMagnetron sputtering system BESTEC3 800**160**
ALDAtomic layer deposition system Ultratech/CambridgeNanoTech Fiji 2003 600150
XEF2XeF2 etching system2 600110
PARYLENESCS Parylene Deposition System2 600110
PECVD-NANOFABHigh-temperature PECVD of C-based materials Oxford Instruments Plasma Technology NanoFab4 000165
Experimental-PECVDPECVD with ion and mass analyzer and optical emission spectroscopy4 400185
APCVDAtmospheric Pressure chemical vapor deposition3 400140
LPCVDLow-pressure chemical vapor deposition3 400140
MOCVDMetal-organic chemical vapor deposition3 800160
PECVDPECVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 1004 400185
DRIEDeep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 1004 000170
SCIAIon beam etching Scia Systems Coat 2003 900160
RIE-CHLORINEReactive ion etching of III-V semiconductors Oxford Instruments Plasma Technology PlasmaPro 1003 200135
RIE-FLUORINERIE of Si-based materials/deposition of thin films Oxford Instruments PlasmaPro NGP 804 200175





Packaging

CZK/hourEUR/hour
WIRE-BONDERWire bonder TPT HB 162 600105
LASER-DICERLaser dicer Oxford Lasers A-Series3 000125
DICING-SAWSemiautomatic dicing saw ESEC 80033 000120
CPD-AUTOSAMDRICritical Point Dryer – Tousimis Autosamdri-815B3 000120





Nanocharacterization Laboratory




UHV Technologies

CZK/hourEUR/hour
SIMSSecondary Ion Mass Spectroscopy ION-TOF TOF.SIMS54 900205
KRATOS-XPSX-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra4 900205
NANOSAMnanoScanning Auger Microscopy Scienta Omicron nanoSAM Lab4 900205
UHV-CLUSTERUltra-High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS3 400140





Microscopy and nanomanipulation

CZK/hourEUR/hour
LYRAFocused Ion Beam/Scanning Electron Microscope TESCAN LYRA34 200175
MIRA3-XMUScanning electron microscope (SEM) MIRA3 XMU3 400140
ICON-SPMScanning Probe Microscope Bruker Dimension Icon3 600150
NANOSCANNanoScan VLS-803 600150
RAMANWitec Alpha 300R3 600150
KERR-MICROSCOPEMagneto-optical Kerr microscope3 100130
NANOINDENTORHysitron TI 9503 800160





Optical measurements

CZK/hourEUR/hour
FTIRVacuum FTIR Vertex80v + microscope Hyperion 3000 KIT4 300180
WOOLLAM-VISNIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE3 100130
WOOLLAM-MIRMIR spectroscopic ellipsometer J. A. Woollam IR-VASE3 300135
VUVASVacuum ultraviolet spectrometer McPherson VUVAS 10002 900120
NIRQUEST512NIR Optical Spectrometer Ocean Optics NIRQuest 5122 800120
JAZ3UV-VIS Optical Spectrometer Ocean Optics JAZ 3-channel2 800120
SNOM-NANONICSScanning Near-field Optical Microscopy Nanonics Imaging MV 40003 900165
TERSScanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar II3 700155





Electrical and magnetic measurements

CZK/hourEUR/hour
SUMMITSemi-automated 4-probe system Cascade Microtech SUMMIT 120003 600150
MPS1504-probe station Cascade Microtech MPS 1502 700110
KEITHLEYKeithley 4200-SCS Parameter Analyzer2 700110
VERSALABCryogenic-free VSM and ETO measurement system – Quantum Design, VersaLab2 800120
LAKESHORELow-Temperature Electro-Magnetic Properties Measurement System LakeShore CRX-EM-HF3 600150
CRYOGENICLow-Temperature Vibrating Sample Magnetometer Cryogenic Limited3 800155





Structural analysis laboratory




Electron microscopy

CZK/hourEUR/hour
TITANHigh resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed7 200300
HELIOSFocused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 6604 900205
VERIOSHigh-resolution Scanning Electron Microscope FEI Verios 460L4 200175





Sample preparation

CZK/hourEUR/hour
STEMIStereomicroscope Zeiss Stemi 5082 20090
TENUPOLTEM electrolytic polisher Tenupol 52 600110
FISCHIONE-160TEM specimen grinding tool Fischione 1602 20090
FISCHIONE-170Ultrasonic TEM disc cutter Fischione 1702 400100
CITOVACVacuum impregnation chamber Citovac2 30095
LEICACOAT-STANCoater Leica EM ACE6002 600105
TXPTarget surfacing system Leica TXP2 20090
TIC3XCross-section/broad beam ion polisher Leica EM TIC3X3 100130
FISCHIONE-200Dimple grinder Fichione 2002 30095
LECTROPOLElectrolytic polisher Lectropol 52 500105
TEGRAMINGrinder/polisher Tegramin 302 500105
ZEISS-Z1MInverted light microscope Zeiss Axio Observer Z1m2 400100
FISCHIONE-TEM MILLIon polisher Fischione TEM Mill 10503 300140
LABOTOM5Metallographic saw Labotom 52 600105
CITOPRESSMounting press Citopress 102 20090
PLASMACLEANERPlasma cleaner Fischione 10202 700115
SAW-ACCUTOMPrecision saw Accutom 1002 700115
LEICACOAT-NANOHigh vacuum coating system for electron microscopy Leica Microsystems EM ACE 6002 600105





X-ray diffractometry

CZK/hourEUR/hour
RIGAKU9X-ray diffractometer with high brightness source Rigaku SmartLab 9kW3 800160
RIGAKU3X-ray powder diffractometer Rigaku SmartLab 3kW3 400140





Micro & Nano X-ray CT laboratory

CZK/hourEUR/hour
microCTmicroCT GE phoenix v|tome|x L2404 000160
nanoCTnanoCT Rigaku nano3DX3 500145





Laser Spectroscopy laboratory

CZK/hourEUR/hour
LIBSLaser-Induced Breakdown Spectroscopy3 500145

 
* Prices without VAT
** Au/Pt – 25 CZK/nm (EVAPORATOR, MAGNETRON)
     Prices in EUR are approximately at the rate of 24 CZK = 1 EUR