Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)

Profile card (PDF)

Atomic Layer Deposition is a deposition technique for very thin layers with the thickness control down to a single atomic layer. It belongs to the CVD techniques family. The thickness precision is achieved by pulsed deposition, where first a metal-containing precursor is introduced into the chamber and after a short time (allowing for monolayer adsorption) the chamber is pumped down. The following step is exposure to the oxidizing precursor (for oxides) or nitrogen-containing precursor (for nitrides). Thus, a monolayer of the target material is grown. The metal-containing precursors are usually organometallic ones, for oxidation a water or oxygen plasma can be used, nitridation is done using nitrogen plasma. To achieve the deposition in the ALD mode, the sample is heated up to a certain temperature, for most processes being in the range from 150 to 300 °C.

Publications:

• KEPIČ, P.; LIŠKA, P.; IDESOVÁ, B.; CAHA, O.; LIGMAJER, F.; ŠIKOLA, T., 2024: Pulsed laser deposition of Sb₂S₃ films for phase-change tunable nanophotonics. NEW JOURNAL OF PHYSICS 26(1), p. 1 - 8, doi: 10.1088/1367-2630/ad1696; FULL TEXT
  (ICON-SPM, KRATOS-XPS, LYRA, ALD, WITEC-RAMAN, RIGAKU9, WOOLLAM-VIS)
• Bawab, B.; Thalluri, S. M.; Kolíbalová, E.; Zazpe, R.; Jelinek, L.; Rodriguez-Pereira, J.; Macak, J. M., 2024: Synergistic effect of Pd single atoms and nanoparticles deposited on carbon supports by ALD boosts alkaline hydrogen evolution reaction. CHEMICAL ENGINEERING JOURNAL 482, doi: 10.1016/j.cej.2024.148959; FULL TEXT
  (ALD, VERIOS, TITAN, KRATOS-XPS, RIGAKU3)
• WOJEWODA, O.; LIGMAJER, F.; HRTOŇ, M.; KLÍMA, J.; DHANKHAR, M.; DAVÍDKOVÁ, K.; STAŇO, M.; HOLOBRÁDEK, J.; KRČMA, J.; ZLÁMAL, J.; ŠIKOLA, T.; URBÁNEK, M., 2023: Observing high-k magnons with Mie-resonance-enhanced Brillouin light scattering. COMMUNICATIONS PHYSICS 6(1), p. 1 - 10, doi: 10.1038/s42005-023-01214-z; FULL TEXT
  (RAITH, MIRA-EBL, EVAPORATOR, MAGNETRON, ALD, LYRA, ICON-SPM, BRILLOUIN)
• HEMZAL, D.; PRÁŠEK, J.; HRDÝ, R.; DRBOHLAVOVÁ, J.; KOPP, R., 2023: Surface-enhanced Raman spectroscopy investigation of PO3- (4) to Ag/Al2O3 nanopatterned substrates binding and its dynamics for sensitive detection of phosphate in water. JOURNAL OF RAMAN SPECTROSCOPY , p. 1074 - 10, doi: 10.1002/jrs.6587; FULL TEXT
  (EVAPORATOR, ALD)
• GAO, W.; PERALES RONDON, J.; MICHALIČKA, J.; PUMERA, M., 2023: Ultrathin manganese oxides enhance the electrocatalytic properties of 3D printed carbon catalysts for electrochemical nitrate reduction to ammonia. APPLIED CATALYSIS B: ENVIRONMENTAL 330, doi: 10.1016/j.apcatb.2023.122632; FULL TEXT
  (ALD, VERIOS, LYRA, TITAN, KRATOS-XPS, JASCO)

• GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: Strong coupling in an Au plasmonic antenna-SiO2 layer system: A hybrid-mode analysis. PHYSICAL REVIEW B 107(12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144; FULL TEXT
  (ALD, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, WOOLLAM-MIR, ICON-SPM)
• ROVENSKÁ, K.; LIGMAJER, F.; IDESOVÁ, B.; KEPIČ, P.; LIŠKA, J.; CHOCHOL, J.; ŠIKOLA, T., 2023: Structural color filters with compensated angle-dependent shifts. OPTICS EXPRESS 31(26), p. 43048 - 9, doi: 10.1364/OE.506069; FULL TEXT
  (EVAPORATOR, MIRA-EBL, RIE-CHLORINE, ALD, SNOM-NANONICS, TUBE-FURNACE)
• NG, S.; SANNA, M.; REDONDO NEGRETE, E.; PUMERA, M., 2023: Engineering 3D-printed carbon structures with atomic layer deposition coatings as photoelectrocatalysts for water splitting. JOURNAL OF MATERIALS CHEMISTRY A 12(1), p. 396 - 9, doi: 10.1039/d3ta04460b; FULL TEXT
  (ALD, KRATOS-XPS, VERIOS)
• Idesová, B., 2023: Design and fabrication of dielectric metasurfaces for ultraviolet wavelengths. MASTER´S THESIS , p. 1 - 71; FULL TEXT
  (EVAPORATOR, ALD, RAITH, NANOCALC, SCIA)
• Henrotte, O.; Kment, Š.; Naldoni, A., 2023: Interfacial States in Au/Reduced TiO2 Plasmonic Photocatalysts Quench Hot-Carrier Photoactivity. JOURNAL OF PHYSICAL CHEMISTRY C 127(32), p. 15861 - 15870, doi: 10.1021/acs.jpcc.3c04176; FULL TEXT
  (ALD)
• KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664; FULL TEXT
  (ALD, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
• WANG, L.; NG, S.; JYOTI, J.; PUMERA, M., 2022: Al2O3/Covalent Organic Framework on 3D-Printed Nanocarbon Electrodes for Enhanced Biomarker Detection. ACS APPLIED NANO MATERIALS 5(7), p. 9719 - 9, doi: 10.1021/acsanm.2c01937; FULL TEXT
  (ALD, KRATOS-XPS, VERIOS)
• Sreedhara, MB.; Bukvisova, K.; Khadiev, A.; Citterberg, D.; Cohen, H.; Balema, V.; Pathak, AK.; Novikov, D.; Leitus, G.; Kaplan-Ashiri, I.; Kolibal, M.; Enyashin, AN.; Houben, L.; Tenne, R., 2022: Nanotubes from the Misfit Layered Compound (SmS)(1.)19TaS2: Atomic Structure, Charge Transfer, and Electrical Properties. CHEMISTRY OF MATERIALS 34(4), p. 1838 - 16, doi: 10.1021/acs.chemmater.1c04106; FULL TEXT
  (TITAN, HELIOS, RAITH, EVAPORATOR, MPS150, KEITHLEY-4200, ALD)
• GAO, W.; MICHALIČKA, J.; PUMERA, M., 2022: Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries. SMALL 18(1), p. 2105572-1 - 13, doi: 10.1002/smll.202105572; FULL TEXT
  (ALD, VERIOS, MIRA-STAN, TITAN, RIGAKU3, KRATOS-XPS)
• Dhankhar, M.;, 2021: Magnetic vortex based memory device. PH.D. THESIS , p. 1 - 100; FULL TEXT
  (KERR-MICROSCOPE, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD, WIRE-BONDER, SUSS-RCD8, ICON-SPM)
• NG, S.; IFFELSBERGER, C.; MICHALIČKA, J.; PUMERA, M., 2021: Atomic Layer Deposition of Electrocatalytic Insulator Al2O3 on Three-Dimensional Printed Nanocarbons. ACS NANO 15(1), p. 686 - 12, doi: 10.1021/acsnano.0c06961; FULL TEXT
  (TITAN, ALD, KRATOS-XPS, VERIOS)
• Pejchal, T., 2021: Towards highly-doped Ge and ZnO nanowires: Growth, characterization and doping level analysis. PH.D. THESIS ; FULL TEXT
  (NANOSAM, WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, VERIOS, KRATOS-XPS, HELIOS, TITAN, ALD, EVAPORATOR, MIRA-EBL, MPS150)
• Dallaev, R., 2021: Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods. VACUUM 193, doi: 10.1016/j.vacuum.2021.110533; FULL TEXT
  (ALD, SIMS, ICON-SPM)
• Burda, D.; Allaham, M.M.; Knapek, A.; Sobola, D.; Mousa, M.S., 2021: Field emission properties of sharp tungsten cathodes coated with a thin resilient oxide barrier. INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE , p. 178 - 179, doi: 10.1109/IVNC52431.2021.9600704; FULL TEXT
  (ALD)
• KAUSHIK, P.; ELIÁŠ, M.; PRÁŠEK, J.; MICHALIČKA, J.; ZAJÍČKOVÁ, L., 2021: Manipulating MWCNT/TiO2 heterostructure morphology at nanoscale and its implications to NO2 sensing properties. MATERIALS CHEMISTRY AND PHYSICS 271, p. 124901-1 - 11, doi: 10.1016/j.matchemphys.2021.124901; FULL TEXT
  (EVAPORATOR, PECVD-NANOFAB, DIENER, ALD, RIGAKU9, VERIOS, TITAN)
• Rovenská, K., 2020: Dielectric metasurfaces as modern optical components. MASTER´S THESIS , p. 1 - 57
  (MAGNETRON, DEKTAK, KRATOS-XPS, MIRA-EBL, EVAPORATOR, VERIOS, RIE-FLUORINE, ALD)
• Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
  (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, NANOCALC, MPS150, WIRE-BONDER, ICON-SPM)
• Vida, J., 2019: Deposition of ternary oxides with titanium and characterization of their optical and electrical properties. MASTER´S THESIS , p. 1 - 50
  (ALD, WOOLLAM-VIS, VUVAS, EVAPORATOR, SUSS-MA8, SUMMIT, KRATOS-XPS, RIGAKU3)
• HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 4, doi: 10.1109/ISSE.2019.8810156; FULL TEXT
  (ALD, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
• Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
  (SUSS-RCD8, SUSS-MA8, DWL, DRIE, ALD, RIE-FLUORINE, PARYLENE, XEF2, LYRA, ICON-SPM)
• Konečný, A., 2019: Evaluation of Different Dielectrics For Mid-Infrared Waveguides. BACHELOR´S THESIS , p. 1 - 32; FULL TEXT
  (MAGNETRON, PECVD, ALD, WOOLLAM-MIR)
• Pokorný, D., 2019: Morphology study of ultra thin layers by XPS analysis of multiple peaks of a single element. MASTER´S THESIS , p. 1 - 71
  (WOOLLAM-VIS, ALD, KRATOS-XPS)
• KAUSHIK, P.; ELIÁŠ, M.; MICHALIČKA, J.; HEGEMANN, D.; PYTLÍČEK, Z.; NEČAS, D.; ZAJÍČKOVÁ, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 9, doi: 10.1016/j.surfcoat.2019.04.031; FULL TEXT
  (ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, VERIOS, TITAN, KRATOS-XPS, RIGAKU3)
• Kaushik, P.; Elias, M.; Prasek, J.; Pytlicek, Z.; Zajickova, L., 2018: Titanium dioxide modified multi-walled carbon nanotubes as room temperature NH3 gas sensors. ELECTRONICS TECHNOLOGY (ISSE) , p. 959 - 961
  (ALD, TERS, LYRA)
• Procházka, P., 2018: Fabrication of graphene and study of its physical properties. PH.D. THESIS , p. 1 - 139
  (ALD, DIENER, EVAPORATOR, MIRA-EBL, PECVD, TERS, WIRE-BONDER)
• Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER´S THESIS , p. 1 - 68
  (DWL, ALD, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE)
• STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10(37), p. 17520 - 5, doi: 10.1039/c8nr06483k; FULL TEXT
  (ALD, DIENER, DWL, EVAPORATOR)
• PROCHÁZKA, P.; MAREČEK, D.; LIŠKOVÁ, Z.; ČECHAL, J.; ŠIKOLA, T., 2017: X-ray induced electrostatic graphene doping via defect charging in gate dielectric. SCIENTIFIC REPORTS 7, p. 1 - 7, doi: 10.1038/s41598-017-00673-z; FULL TEXT
  (MIRA-EBL, DIENER, ALD, WIRE-BONDER)
• Xiao, N.;Villena, M.A.; Yuan, B.; Chen, S.; Wang, B.; Eliáš, M.; Shi, Y.; Hui, F.; Jing, X.; Scheuermann, A.; Tang, K.; McIntyre, P.C., 2017: Resistive Random Access Memory Cells with a Bilayer TiO2/SiOX Insulating Stack for Simultaneous Filamentary and Distributed Resistive Switching. ADVANCED FUNCTIONAL MATERIALS 27(33), p. 859 - 7, doi: 10.1002/adfm.201700384; FULL TEXT
  (ALD)
• Musálek, T., 2016: Semiconductor nanowire growth utilizing alloyed catalyst. MASTER’S THESIS , p. 1 - 52
  (UHV-MBE, VERIOS, MIRA-EBL, ALD, LYRA)
• Andrýsek, M., 2016: Preparation of surfaces with diffusion barrier for studying initial phase of semiconductor nanowire growth. BACHELOR’S THESIS , p. 1 - 22
  (VERIOS, ALD, TERS, LYRA)
• Lišková, Z., 2015: Fabrication of Nanostructures and Nanodevices for Nanoelectronics and Spintronics. PH.D. THESIS , p. 1 - 106
  (MIRA-EBL, DIENER, NANOCALC, DWL, EVAPORATOR, WIRE-BONDER, ALD, LYRA)
• Švarc, V., 2015: Shielding effect of oxide isolating layer on surface potential measured by Kelvin probe force microscopy. MASTER´S THESIS , p. 1 - 50
  (ALD, DIENER, WIRE-BONDER, LYRA)