RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
Guarantor:
Marek Eliáš, Ph.D.
Instrument status:
Some Issues, 27.7.2026 10:30, The pressure gauge has an offset zero, and the pressure during the process must be adjusted using the angle.
Equipment placement:
CEITEC Nano - C1.34
Upcoming trainings:
21.8. 09:30 - 12:00:
RIE-flourine - training -
Reactive-ion etching (RIE) is a microfabrication etching technology. RIE is a type of dry etching that differs from wet etching in several respects. RIE uses chemically reactive plasma to remove deposited material from wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.
A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber with a wafer platter at the bottom of the chamber. The wafer platter is electrically isolated from the rest of the chamber. Gas enters through small inlets in the top of the chamber and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon. Gas pressure is typically maintained in a range of a few millitorrs to a few hundred millitorrs by adjusting gas flow rates and/or an exhaust orifice.
Publications:
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MIGLIACCIO, L.; SAY, M.; PATHAK, G.; GABLECH, I.; BRODSKÝ, J.; DONAHUE, M.; GLOWACKI, E., 2025: Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte-Gated Transistors for Bioelectronics. ADVANCED MATERIALS TECHNOLOGIES , p. 2302219 - 9, doi: 10.1002/admt.202302219; FULL TEXT
(SUSS-MA8, RIE-FLUORINE, PARYLENE-DIENER, KEITHLEY-4200) -
TAKHSHA GHAHFAROKHI, M.; HORKÝ, M.; NASI, L.; KOSOGOR, A.; TREVISI, G.; CASOLI, F.; ARREGI URIBEETXEBARRIA, J.; BRESCIA, R.; UHLÍŘ, V.; ALBERTINI, F., 2025: Spatially confined magnetic shape-memory Heuslers: Implications for nanoscale devices. ACTA MATERIALIA 284, p. 1 - 11, doi: 10.1016/j.actamat.2024.120579; FULL TEXT
(VERIOS, MIRA-EBL, RIE-FLUORINE, VERSALAB, WIRE-BONDER) -
DODD, S.; GUDINO, N.; ZADOROZHNII, O.; STAŇO, M.; HAJDUČEK, J.; ARREGI URIBEETXEBARRIA, J.; MORRIS, H.; UHLÍŘ, V.; BARBIC, M.; KORETSKY, A., 2025: Field switching of microfabricated metamagnetic FeRh MRI contrast agents. SCIENTIFIC REPORTS 15(1), p. 1 - 10, doi: 10.1038/s41598-025-85384-6; FULL TEXT
(MAGNETRON, VERSALAB, MIRA-EBL, EVAPORATOR, RIE-FLUORINE, ICON-SPM, KERR-MICROSCOPE) -
Wang, Y.; Guo, M.; Davídková, K.; Verba, R.; Guo, X.; Dubs, C.; Chumak, A. V.; Pirro, P.; Wang, Q., 2025: Fast switchable unidirectional forward volume spin-wave emitter. PHYSICAL REVIEW APPLIED 23(1), p. 1 - 10, doi: 10.1103/PhysRevApplied.23.014066; FULL TEXT
(MIRA-EBL, RIE-FLUORINE, SCIA, EVAPORATOR) -
Horký, M., 2025: . PH.D. THESIS , p. 1 - 181; FULL TEXT
(RAITH, MIRA-EBL, LYRA, TEGRAMIN, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, UHV-PREPARATION, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9)
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Brodský, J.; Liu, X.; Jarušek, J.; Migliaccio, L.; Neužil, P.; Zítka, O.; Gablech, I., 2025: . SENSORS AND ACTUATORS A: PHYSICAL 392, p. 1 - 6, doi: 10.1016/j.sna.2025.116719; FULL TEXT
(SUSS-MA8, RIE-FLUORINE, DRIE) -
SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7(13), p. 5889 - 5897, doi: 10.1021/acsaelm.5c00351; FULL TEXT
(DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA) -
TAKHSHA, M.; SINGH, V.; LEDIEU, J.; FABBRICI, S.; CASOLI, F.; MEZZADRI, F.; HORKÝ, M.; FOURNEE, V.; UHLÍŘ, V.; ALBERTINI, F., 2025: Magnetic Manipulation of Spatially Confined Multiferroic Heuslers by Martensitic Microstructure Engineering. SMALL STRUCTURES 6(11), p. 1 - 12, doi: 10.1002/sstr.202500284; FULL TEXT
(VERIOS, VERSALAB, SUSS-MA8, RIE-FLUORINE, KERR-MICROSCOPE) -
Liu, X.; Brodský, J.; Vírostko, J.; Jarušek, J.; Migliaccio, L.; Zítka, O.; Gablech, I.; Neužil, P., 2025: . SCIENTIFIC REPORTS 15(1), doi: 10.1038/s41598-025-24442-5; FULL TEXT
(DRIE, SUSS-MA8, RIE-FLUORINE) -
Děcký, M., 2025: . MASTER'S THESIS , p. 1 - 63; FULL TEXT
(MIRA-EBL, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, MPS150, LYRA, LASER-DICER) -
Singh, A.; Němec, H.; Kunc, J.; Kužel, P., 2025: . JOURNAL OF PHYSICS D: APPLIED PHYSICS 58(4), doi: 10.1088/1361-6463/ad8e71; FULL TEXT
(RAITH, MIRA-EBL, RIE-FLUORINE) -
Singh, A.; Němec, H.; Kunc, J.; Kužel, P., 2024: . PHYSICAL REVIEW RESEARCH 6(3), doi: 10.1103/PhysRevResearch.6.033063; FULL TEXT
(RAITH, RIE-FLUORINE) -
Kunc, J.; Fridrišek, T.; Shestopalov, M.; Jo, J.; Park, K., 2024: . AIP ADVANCES 14(9), p. 1 - 9, doi: 10.1063/5.0223763; FULL TEXT
(RAITH, RIE-FLUORINE, ALD-FIJI, EVAPORATOR, WIRE-BONDER, KRATOS-XPS) -
Krčma, J., 2024: . BACHELOR'S THESIS ; FULL TEXT
(EVAPORATOR, RAITH, RIE-FLUORINE, KAUFMAN, BRILLOUIN, VERIOS) -
JAKEŠOVÁ, M.; KUNOVSKÝ, O.; GABLECH, I.; KHODAGHOLY, D.; GELINAS, J.; GLOWACKI, E., 2024: . JOURNAL OF NEURAL ENGINEERING 21(4), doi: 10.1088/1741-2552/ad593d; FULL TEXT
(PARYLENE-SCS, MAGNETRON, SUSS-MA8, EVAPORATOR, RIE-FLUORINE, DIENER, WIRE-BONDER) -
GRYSZEL, M.; JAKEŠOVÁ, M.; VU, X.; INGEBRANDT, S.; GLOWACKI, E., 2024: . ADVANCED HEALTHCARE MATERIALS , doi: 10.1002/adhm.202302400; FULL TEXT
(EVAPORATOR, DEKTAK, RIE-FLUORINE, DWL, SUSS-MA8) -
Liu, X.; Fohlerová, Z.; Gablech, I.; Pumera, M.; Neužil, P., 2024: . APPLIED MATERIALS TODAY 37, doi: 10.1016/j.apmt.2024.102117; FULL TEXT
(RIE-FLUORINE, DRIE, PARYLENE-SCS, XEF2) -
Novotný, A., 2024: . BACHELOR'S THESIS , p. 1 - 53; FULL TEXT
(TITAN, MIRA-EBL, LYRA, RIE-FLUORINE, WITEC-RAMAN) -
Koňařík, L., 2024: . BACHELOR'S THESIS , p. 1 - 46; FULL TEXT
(LASER-DICER, DWL, EVAPORATOR, RIE-FLUORINE, DRIE, NANOCALC, DEKTAK, WIRE-BONDER, LYRA) -
ZANGANA, S.; LEDNICKÝ, T.; BONYÁR, A., 2023: . CHEMOSENSORS 11(4), p. 1 - 14, doi: 10.3390/chemosensors11040235; FULL TEXT
(VERIOS, HELIOS, RIE-FLUORINE, DIENER) -
Kunc, J.; Morzhuk, B.; Shestopalov, M.; Fridrišek, T.; Dědič, V., 2023: . REVIEW OF SCIENTIFIC INSTRUMENTS 94(5), doi: 10.1063/5.0139027; FULL TEXT
(RAITH, MIRA-EBL, EVAPORATOR, RIE-FLUORINE) -
KNAUER, S.; DAVÍDKOVÁ, K.; SCHMOLL, D.; SERHA, R.; VORONOV, A.; WANG, Q.; VERBA, R.; DOBROVOLSKIY, O.; LINDNER, M.; REIMANN, T.; DUBS, C.; URBÁNEK, M.; CHUMAK, A., 2023: . JOURNAL OF APPLIED PHYSICS 133(14), p. 1 - 8, doi: 10.1063/5.0137437; FULL TEXT
(RAITH, RIE-FLUORINE, SCIA, BRILLOUIN, EVAPORATOR, VNA-MPI) -
BRODSKÝ, J.; GABLECH, I.; MIGLIACCIO, L.; HAVLÍČEK, M.; DONAHUE, M.; GLOWACKI, E., 2023: . ACS APPL MATER INTER 15(22), p. 27002 - 8, doi: 10.1021/acsami.3c02049; FULL TEXT
(SUSS-MA8, EVAPORATOR, SCIA, PARYLENE-SCS, RIE-FLUORINE, MIRA-EBL, DEKTAK, ICON-SPM) -
Sharifahmadian, O.; Pakseresht, A.; Mirzaei, S.; Eliáš, M.; Galusek, D., 2023: . DIAMOND AND RELATED MATERIALS 138, doi: 10.1016/j.diamond.2023.110252; FULL TEXT
(VERIOS, SEE-SYSTEM, NANOINDENTER, RIE-FLUORINE, KRATOS-XPS) -
ŠVARC, V.; BARTOŠÍK, M.; KONEČNÝ, M.; PIASTEK, J.; NEZVAL, D.; MACH, J.; ŠIKOLA, T., 2023: . CARBON 215, p. 118471 - 12, doi: 10.1016/j.carbon.2023.118471; FULL TEXT
(RIE-FLUORINE, EVAPORATOR, MIRA-EBL, WIRE-BONDER) -
ABUDLLAEVA, O.; SAHALIANOV, I.; EJNEBY, M.; JAKEŠOVÁ, M.; ZOZOULENKO, I.; LIIN, S.; GLOWACKI, E., 2022: . ADVANCED SCIENCE , p. 1 - 14, doi: 10.1002/advs.202103132; FULL TEXT
(DIENER, EVAPORATOR, SUSS-MA8, PARYLENE-SCS, RIE-FLUORINE) -
GABLECH, I.; BRODSKÝ, J.; VYROUBAL, P.; PIASTEK, J.; BARTOŠÍK, M.; PEKÁREK, J., 2022: . JOURNAL OF MATERIALS SCIENCE 57(3), p. 1923 - 13, doi: 10.1007/s10853-021-06846-6; FULL TEXT
(RIE-FLUORINE, DRIE, EVAPORATOR, WIRE-BONDER, WITEC-RAMAN, MPS150, KEITHLEY-4200, SUSS-MA8, DWL) -
Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: . JOURNAL OF LOW TEMPERATURE PHYSICS , doi: 10.1007/s10909-022-02675-2; FULL TEXT
(PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA) -
Fridrišek, T., 2022: . MASTER'S THESIS
(MIRA-EBL, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, LYRA) -
SEPÚLVEDA SEPÚLVEDA, L.; KAMNEV, K.; PYTLÍČEK, Z.; PRÁŠEK, J.; MOZALEV, A., 2021: . ACS APPLIED NANO MATERIALS 4(2), p. 1754 - 12, doi: 10.1021/acsanm.0c03202; FULL TEXT
(MAGNETRON, RIE-FLUORINE, VERIOS, JAZ3-CHANNEL) -
GHAHFAROKHI, M.; ARREGI URIBEETXEBARRIA, J.; CASOLI, F.; HORKÝ, M.; CABASSI, R.; UHLÍŘ, V.; ALBERTINI, F., 2021: . APPLIED MATERIALS TODAY 23, p. 101058-1 - 11, doi: 10.1016/j.apmt.2021.101058; FULL TEXT
(VERSALAB, RIGAKU9, KERR-MICROSCOPE, SUSS-MA8, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, VERIOS) -
Zadorozhnii, O., 2021: . MASTER'S THESIS , p. 1 - 81; FULL TEXT
(MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA) -
Brodský J., 2021: . MASTER'S THESIS , p. 1 - 84; FULL TEXT
(DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, WITEC-RAMAN, RIE-FLUORINE, DRIE, LYRA, ICON-SPM) -
VAŇATKA, M.; SZULC, K.; WOJEWODA, O.; DUBS, C.; CHUMAK, A.; KRAWCZYK, M.; DOBROVOLSKIY, O.; KLOS, J.; URBÁNEK, M., 2021: . PHYSICAL REVIEW APPLIED 16(5), p. 054033-1 - 10, doi: 10.1103/PhysRevApplied.16.054033; FULL TEXT
(VNA-MPI, BRILLOUIN, RAITH, EVAPORATOR, MAGNETRON, DIENER, VERIOS, RIE-FLUORINE) -
Slavík, J., 2021: . PH.D. THESIS , p. 1 - 102; FULL TEXT
(DWL, EVAPORATOR, PARYLENE-SCS, RIE-FLUORINE, MAGNETRON, LEICACOAT-NANO, LYRA, ICON-SPM) -
SLAVÍK, J.; ČMIEL, V.; HUBÁLEK, J.; YANG, Y.; REN, T.-L., 2021: . APPLIED SCIENCES-BASEL 11(1), p. 1 - 12, doi: 10.3390/app11010275; FULL TEXT
(PARYLENE-SCS, RIE-FLUORINE) -
LEDNICKÝ, T.; BONYÁR, A., 2020: . ACS APPL MATER INTER 12(4), p. 4804 - 11, doi: 10.1021/acsami.9b20907; FULL TEXT
(MAGNETRON, RIE-FLUORINE, VERIOS, HELIOS, LYRA, KRATOS-XPS) -
Chmela, O., 2020: . PH.D THESIS , p. 1 - 199
(ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, NANOCALC, MPS150, WIRE-BONDER, ICON-SPM) -
Hache, T.; Vanatka, M.; Flajsman, L.; Weinhold, T.; Hula, T.; Ciubotariu, O.; Albrecht, M.; Arkook, B.; Barsukov, I.; Fallarino, L.; Hellwig, O.; Fassbender, J.; Urbanek, M.; Schultheiss, H., 2020: . PHYSICAL REVIEW APPLIED 13(5), p. 054009-1 - 10, doi: 10.1103/PhysRevApplied.13.054009; FULL TEXT
(RAITH, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, BRILLOUIN) -
Rovenská, K., 2020: . MASTER'S THESIS , p. 1 - 57
(MAGNETRON, DEKTAK, MIRA-EBL, EVAPORATOR, VERIOS, RIE-FLUORINE, ALD-FIJI, KRATOS-XPS) -
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: . JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38(6), p. 38 - 6, doi: 10.1116/6.0000558; FULL TEXT
(SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA) -
LIŠKA, J.; LIGMAJER, F.; PINHO NASCIMENTO, P.; KEJÍK, L.; KVAPIL, M.; DVOŘÁK, P.; HORKÝ, M.; LEITNER, N.; REIMHULT, E.; ŠIKOLA, T., 2020: . MICROELECTRONIC ENGINEERING 228, p. 1 - 6, doi: 10.1016/j.mee.2020.111326; FULL TEXT
(EVAPORATOR, RIE-FLUORINE, MIRA-EBL, LYRA, ICON-SPM) -
Hajduček, J., 2019: . BACHELOR'S THESIS , p. 1 - 46
(MAGNETRON, CRYOGENIC, MIRA-EBL, RIE-FLUORINE, EVAPORATOR, VERSALAB, ICON-SPM) -
Brodský, J., 2019: . BACHELOR'S THESIS , p. 1 - 50
(MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA) -
Fecko, P., 2019: . MASTER'S THESIS , p. 1 - 52
(SUSS-RCD8, SUSS-MA8, DWL, DRIE, ALD-FIJI, RIE-FLUORINE, PARYLENE-SCS, XEF2, LYRA, ICON-SPM) -
Hegrová, V., 2019: . MASTER'S THESIS , p. 1 - 64
(LITESCOPE-LYRA, MIRA-EBL, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, LYRA) -
CHMELA, O.; SADÍLEK, J.; SAMA, DOMENECH-GIL, G.; J.; SOMER, J.; MOHAN, R.; ROMANO-RODRIGUEZ, A.; HUBÁLEK, J.; VALLEJOS VARGAS, S., 2018: . NANOSCALE 10(19), p. 9087 - 10, doi: 10.1039/c8nr01588k; FULL TEXT
(RAITH, DWL, KAUFMAN, MAGNETRON, SCIA, RIE-FLUORINE, WIRE-BONDER, RIGAKU3) -
Vančík, S., 2018: . MASTER'S THESIS , p. 1 - 68
(DWL, ALD-FIJI, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE) -
Pekárek, J.; Prokop, R.; Svatoš, V.; Gablech, I.; Hubálek, J.; Neužil, P., 2017: . SENSORS AND ACTUATORS, A: PHYSICAL 265, p. 40 - 46, doi: 10.1016/j.sna.2017.08.025
(SUSS-MA8, EVAPORATOR, RIE-FLUORINE, SUMMIT, SCIA) -
Chmela, O; Sadilek, J; Sama, J; Romano-Rodriguez, A; Hubalek, J; Vallejos, S, 2017: . NANOTECHNOLOGY VIII 10248, doi: 10.1117/12.2265000
(RAITH, DWL, KAUFMAN, SCIA, RIE-FLUORINE, MAGNETRON, RIGAKU3) -
Fabianová, K., 2016: . BACHELOR’S THESIS , p. 1 - 54
(PECVD, MIRA-EBL, RIE-FLUORINE, NANOCALC, MAGNETRON, EVAPORATOR, LYRA)
Photogallery
Specification
| CCP 13.56 MHz at substrate electrode (bias) | max. power 600 W |
|---|---|
| substrate temperature from | from - 30 to 80 °C |
| sample size | up to 8" |
| He backside cooling | |
| gases: | SF6, Ar, O2, CHF3,CH4, C2H2, NH3, H2 |
| Processes: | etching of Si, SiO2, Si3N4, TiO2, Au, Pt and deposition of DLC and CN films |
Documents
Here is place for your documents.
+420 54114 9207
nano@ceitec.vutbr.cz
