Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)

The chamber for sample heating and sputtering (UHV-Preparation) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. It provides the possibility of:
- cleaning and basic preparation of the surfaces of the substrates,
- ion sputtering (Ar ions) and annealing (e-beam heating, direct current heating – for clean Si only).
It as well provides the possibility to build-in custom components.

Publications:

• ČECHAL, J.; STARÁ, V.; KUROWSKÁ, A.; BLATNIK, M.; PRAVEC, D.; HRUBÁ, D.; KUNC, J.; DRASAR, C.; PLANER, J.; PROCHÁZKA, P., 2026: Structural, electronic, and chemical manifestations of weak molecule-substrate coupling on Bi2Se3 compared with Ag, Au, and graphene. APPLIED SURFACE SCIENCE ADVANCES , doi: 10.1016/j.apsadv.2025.100927; FULL TEXT
  (UHV-LEEM, UHV-PREPARATION, UHV-XPS, UHV-SPM)
• JAKUB, Z.; PLANER, J.; HRŮZA, D.; TRLLOVÁ SHAHSAVAR, A.; PAVELEC, J.; ČECHAL, J., 2025: Identical Fe-N₄ Sites with Different Reactivity: Elucidating the Effect of Support Curvature. ACS APPLIED MATERIALS & INTERFACES 17(6), p. 10136 - 10144, doi: 10.1021/acsami.4c19913; FULL TEXT
  (UHV-CLUSTER, UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS)
• Prochazka, P.; Frezza, F.; Sánchez-Grande, A.; Carrera, M.; Chen, QF.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Cechal, J., 2025: Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY 31(20), p. e20250056 - 6, doi: 10.1002/chem.202500561; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-DEPOSITION, UHV-PREPARATION)
• PROCHÁZKA, P.; STARÁ, V.; PLANER, J.; SKÁLA, T.; ČECHAL, J., 2025: Structure of epitaxial heteromolecular bilayers probed by low-energy electron microscopy. SURFACES AND INTERFACES 62, p. 106251-1 - 106251-8, doi: 10.1016/j.surfin.2025.106251; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Horký, M., 2025: . PH.D. THESIS , p. 1 - 181; FULL TEXT
  (RAITH, MIRA-EBL, LYRA, TEGRAMIN, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, UHV-PREPARATION, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9)

• JAKUB, Z.; PLANER, J.; HRŮZA, D.; ENDSTRASSER, Z.; PROCHÁZKA, P.; ČECHAL, J., 2025: Atomically-defined on-surface synthesis of multilayer metal-organic frameworks. COMMUNICATIONS CHEMISTRY 8(1), doi: 10.1038/s42004-025-01742-5; FULL TEXT
  (UHV-DEPOSITION, UHV-XPS, UHV-SPM, UHV-PREPARATION)
• JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: . JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 12, doi: 10.1021/jacs.3c13212; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: . ACS APPLIED MATERIALS & INTERFACES 16(14), p. 18099 - 13, doi: 10.1021/acsami.3c18697; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM, UHV-DEPOSITION)
• PROCHÁZKA, P.; ČECHAL, J., 2024: . JOURNAL OF APPLIED CRYSTALLOGRAPHY 57(1), p. 187 - 7, doi: 10.1107/S1600576723010312; FULL TEXT
  (UHV-LEEM, UHV-PREPARATION)
• David, J., 2023: . MASTER'S THESIS , p. 1 - 69; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-XPS, UHV-SPM)
• Jeřábek, F., 2023: . BACHELOR'S THESIS , p. 1 - 42; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM)
• VANÍČKOVÁ, E.; PRŮŠA, S.; ŠIKOLA, T., 2023: . SURFACE SCIENCE SPECTRA 30(2), p. 1 - 15, doi: 10.1116/6.0002669; FULL TEXT
  (UHV-LEIS, UHV-PREPARATION)
• Makoveev, A. O., 2023: . PH.D. THESIS , p. 1 - 169; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• PROCHÁZKA, P.; ČECHAL, J., 2023: . ULTRAMICROSCOPY 253, doi: 10.1016/j.ultramic.2023.113799; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-PREPARATION, UHV-SPM)
• Kurowská, A., 2023: . MASTER'S THESIS , p. 1 - 61; FULL TEXT
  (UHV-LEEM, UHV-MBE, UHV-PREPARATION, UHV-SPM, UHV-XPS)
• PEJCHAL, T.; BUKVIŠOVÁ, K.; VALLEJOS VARGAS, S.; CITTERBERG, D.; ŠIKOLA, T.; KOLÍBAL, M., 2022: . APPLIED SURFACE SCIENCE 583, p. 152475 - 6, doi: 10.1016/j.apsusc.2022.152475; FULL TEXT
  (WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, NANOSAM, VERIOS, HELIOS, KRATOS-XPS)
• Krpenský, J., 2022: . MASTER'S THESIS ; FULL TEXT
  (EVAPORATOR, UHV-PREPARATION, VERIOS, TITAN, LYRA)
• MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: . JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126(23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538; FULL TEXT
  (UHV-PREPARATION, UHV-DEPOSITION, UHV-LEEM, UHV-SPM, UHV-XPS)
• JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: . NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: . APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: . PHYSICAL REVIEW APPLIED 18(4), doi: 10.1103/PhysRevApplied.18.044048; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: . APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM)
• Zadorozhnii, O., 2021: . MASTER'S THESIS , p. 1 - 81; FULL TEXT
  (MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA)
• Kormoš, L., 2021: . PH.D. THESIS , p. 1 - 140; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
• Pejchal, T., 2021: . PH.D. THESIS ; FULL TEXT
  (NANOSAM, WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, VERIOS, HELIOS, TITAN, ALD-FIJI, EVAPORATOR, MIRA-EBL, MPS150, KRATOS-XPS)
• KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: . NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: . APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
• PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: . ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
• FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: . NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
• Suchánková, K., 2019: . MASTER'S THESIS , p. 1 - 64
  (UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9)
• Krajňák, T., 2019: . MASTER'S THESIS , p. 1 - 58
  (VERIOS, UHV-PREPARATION, LYRA, KRATOS-XPS)
• REDONDO, J.; LAZAR, P.; PROCHÁZKA, P.; PRŮŠA, S.; MALLADA, B.; CAHLÍK, A.; LACHNITT, J.; BERGER, J.; ŠMÍD, B.; KORMOŠ, L.; JELÍNEK, A.; ČECHAL, J.; ŠVEC, M., 2019: . JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 123(23), p. 14312 - 7, doi: 10.1021/acs.jpcc.9b00244; FULL TEXT
  (UHV-PREPARATION, UHV-LEEM, UHV-LEIS)
• GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: . APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263; FULL TEXT
  (KERR-MICROSCOPE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA, ICON-SPM)
• URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: . APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
  (HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9, KERR-MICROSCOPE, LYRA, ICON-SPM)
• Makoveev, A., 2018: . TREATISE TO STATE DOCTORAL EXAM , p. 1 - 32
  (UHV-LEEM, UHV-MBE, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• KORMOŠ, L.; PROCHÁZKA, P.; ŠIKOLA, T.; ČECHAL, J., 2018: . JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 122(5), p. 2815 - 6, doi: 10.1021/acs.jpcc.7b11436; FULL TEXT
  (UHV-SPM, UHV-LEEM, UHV-PREPARATION)
• Horký, M., 2016: . MASTER'S THESIS , p. 1 - 96
  (UHV-PREPARATION, UHV-XPS, UHV-SPM, VERIOS, UHV-LEIS, RIGAKU3, LYRA, ICON-SPM, KRATOS-XPS)