Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)


Guarantor:
Tomáš Šamořil, Ph.D.

Instrument status:
Some Issues Some Issues, 8.3.2024 16:39, FIB out of the order, SEM and EDS work

Equipment placement:
CEITEC Nano - C1.24


Facility for novel methods for lithographic fabrication and manipulation of nanostructures combining Scanning Electron Microscope and Focused Ion Beam Source (i.e. “Dual Beam”) equipped with 4 nanomanipulators (and photon detectors); Scanning Probe Microscopy for Fabrication of Nanostructures by local anodic oxidation and other methods.


Publications:

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Photogallery

Specification

Features

Scanning Electron Microscope with Schottky cathode
Focused Ion Beam column with Ga Liquid – Metal Ion Source with nanometric resolution
Gas Injection System with inlets for up to 5 precursors for deposition and etching of materials
Electron Dispersive X-ray spectroscopy for chemical and elemental analysis
Two fixed closed loop nanomanipulators + additional two sample stage nanomanipulators for electrical measurements
Ready for Transmission Electron Microscopy sample preparation
Electron and Ion Beam Lithography software (milling, etching, deposition)
Integrated controlling software
Active antivibration suspension system
Decontaminator/plas­ma cleaner

Scanning Electron Microscope (SEM)

Tescan LYRA 3 FEG
Accelerating voltage 200 V – 30 kV, 50 V to 30 kV in Beam Deceleration Mode (BDM)
Probe current 2 pA – 200 nA
Detectors / Resolution Secondary Electrons (SE) / 1.2 nm at 30 kV/ 2.5 nm at 3 kV
SE ( BDM) / 1.5 nm at 3 kV
In-Beam BSE / 2.0 nm at 15 kV
Backscattered Secondary Electrons (BSE) / 2 nm at 30 kV
Transmitted Electrons(TE)
Electron Beam Induced Current (EBIC)
Chamber vacuum < 9e-3 Pa (< 5e-4 Pa reachable)
Specimen Stage Movements X = 130 mm (–50 mm to +80 mm)
Y = 130 mm (–65 mm to +65 mm)
Z = 100 mm
Rotation: 360° continuous
Tilt: –30° to +90°

Focused Ion Beam (FIB)

Ion Column Canion
Ion Gun Ga Liquid Metal Ion Source
Accelerating voltage 0.5 kV to 30 kV
Probe current 1 pA to 40 nA
SEM-FIB Coincidence at WD 9 mm for SEM – WD 12 mm for FIB
SEM-FIB angle 55°

Gas Injection System (GIS)

Number of GIS channels installed 5
Type of precursors available Insulator (SiOx), Water, Fluorine, Platinum, Tungsten

Energy Dispersive X-ray (EDX) Detector

Detector type Bruker XFlash 5010
Energy resolution ≤ 129 eV @ MnKα
59 eV @ FKα
52 eV @ CKα


Reservations / Acknowledgement

Documents

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