High-Conductivity Stoichiometric Titanium Nitride for Bioelectronics

ADVANCED ELECTRONIC MATERIALS

GABLECH, I.; MIGLIACCIO, L.; BRODSKÝ, J.; HAVLÍČEK, M.; PODEŠVA, P.; HRDÝ, R.; EHLICH, J.; GRYSZEL, M.; GLOWACKI, E., 2023: High-Conductivity Stoichiometric Titanium Nitride for Bioelectronics. ADVANCED ELECTRONIC MATERIALS 9(4), p. 1 - 11, doi: 10.1002/aelm.202200980; FULL TEXT
(KAUFMAN, PARYLENE, KRATOS-XPS, RIGAKU3, KEITHLEY-4200, LYRA, ICON-SPM)

Equipment:

• Ion-Beam Sputter Deposition System BESTEC (KAUFMAN)
• SCS Parylene Deposition System (PARYLENE)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• X-ray powder diffractometer Rigaku SmartLab 3kW (RIGAKU3)
• Keithley 4200-SCS Parameter Analyzer (KEITHLEY-4200)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• Bioelectronics Materials and Devices
• CF: CEITEC Nano

CEITEC authors:

• Ludovico Migliaccio, Ph.D.
• Jan Brodský
• Radim Hrdý, Ph.D.
• Jiří Ehlich, Ph.D.
• Eric Daniel Glowacki, Ph.D.
• Dr. Marek Havlíček