Large Plasma Enhanced CVD (R2-PECVD)
Guarantor:
Marek Eliáš, Ph.D.
Instrument status:
Operational
The deposition chamber allows plasma processing of large substrates in capacitively coupled plasma (CCP). It is primarily used to deposit amine plasma polymers, i.e., organic thin films containing nitrogen functional groups, by plasma enhanced chemical vapor deposition (PECVD). These films are hydrophilic and have a positive surface charge. They can act as bioactive surface modifications helping the cells to attach to the coated surface, improving the cell adhesion or binding the biomolecules. Any material can be coated, even temperature-sensitive substrates like polycaprolactone nanofibrous mats. The plasma reactor can also be used for plasma treatment of materials in Ar or O2 plasma. This treatment will improve the adhesion of subsequently prepared thin films and change the surface-free energy or roughness. Additionally, oxygen plasma can be applied to etch organic materials, e.g., for surface cleaning. The processes are tunable and flexible because the pressure and RF power will vary the extent of ion bombardment and monomer dissociation. Various PECVD processes can be set up and developed upon a reasonable request. The process receipts are supported by the expertise of Assoc. Prof. Lenka Zajíčková, see https://plasma-technologies.cz/
Publications:
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BUCHTELOVÁ, M.; JANŮ, L.; NEČAS, D.; KŘÍŽKOVÁ, P.; BARTOŠÍKOVÁ, J.; MEDALOVÁ, J.; KOLSKÁ, Z.; HEGEMANN, D.; ZAJÍČKOVÁ, L., 2023: . PLASMA PROCESSES AND POLYMERS 20(6), p. 1 - 15, doi: 10.1002/ppap.202200157; FULL TEXT
(ICON-SPM, R2-PECVD, R4-EXPERIMENTAL-PECVD, KRATOS-XPS) -
KOVAČ, J.; EKAR, J.; ČEKADA, M.; ZAJÍČKOVÁ, L.; NEČAS, D.; BLAHOVÁ, L.; WANG, J.; MOZETIČ, M., 2022: . APPLIED SURFACE SCIENCE 581, p. 1 - 10, doi: 10.1016/j.apsusc.2021.152292; FULL TEXT
(R2-PECVD) -
ČERNOCHOVÁ, P.; BLAHOVÁ, L.; MEDALOVÁ, J.; NEČAS, D.; MICHLÍČEK, M.; KAUSHIK, P.; PŘIBYL, J.; BARTOŠÍKOVÁ, J.; MANAKHOV, A.; BAČÁKOVÁ, L.; ZAJÍČKOVÁ, L., 2020: . SCIENTIFIC REPORTS 10(1), p. 1 - 14, doi: 10.1038/s41598-020-65889-y; FULL TEXT
(SEE-SYSTEM, ICON-SPM, R2-PECVD) -
KUPKA, V.; DVOŘÁKOVÁ, E.; MANAKHOV, A.; MICHLÍČEK, M.; PETRUŠ, J.; VOJTOVÁ, L.; ZAJÍČKOVÁ, L., 2020: . POLYMERS 12(6), p. 1 - 16, doi: 10.3390/polym12061403; FULL TEXT
(LYRA, R2-PECVD, KRATOS-XPS) -
MICHLÍČEK, M.; HAMAGUCHI, S.; ZAJÍČKOVÁ, L., 2020: . PLASMA SOURCES SCIENCE & TECHNOLOGY 29(10), p. 1 - 13, doi: 10.1088/1361-6595/abb2e8; FULL TEXT
(R2-PECVD)
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NĚMČÁKOVÁ, I.; BLAHOVÁ, L.; RYŠÁNEK, P.; BLANQUER, A.; BAČÁKOVÁ, L.; ZAJÍČKOVÁ, L., 2020: . INTERNATIONAL JOURNAL OF MOLECULAR SCIENCES 21(24), p. 1 - 24, doi: 10.3390/ijms21249467; FULL TEXT
(LEICACOAT-STAN, SEE-SYSTEM, LYRA, R2-PECVD, KRATOS-XPS) -
MANAKHOV, A.; LANDOVÁ, M.; MEDALOVÁ, J.; MICHLÍČEK, M.; POLČÁK, J.; NEČAS, D.; ZAJÍČKOVÁ, L., 2017: . PLASMA PROCESSES AND POLYMERS 14(7), p. e1600123-1 - 12, doi: 10.1002/ppap.201600123; FULL TEXT
(DEKTAK, LYRA, ICON-SPM, R2-PECVD) -
Manakhov, A;, Michlicek, M; Felten, A; Pireaux, J J; Necas, D; Zajickova, L., 2017: . APPLIED SURFACE SCIENCE (394), p. 578 - 585, doi: 10.1016/j.apsusc.2016.10.099
(ICON-SPM, R2-PECVD) -
Manakhov, A; Kedronova, E; Medalova, J; Cernochova, P; Obrusnik, A; Michlicek, M; Shtansky, DV; Zajickova, L, 2017: . MATERIALS & DESIGN 132, p. 257 - 265, doi: 10.1016/j.matdes.2017.06.057
(LEICACOAT-NANO, LYRA, R2-PECVD, KRATOS-XPS) -
Makhneva, E; Manakhov, A; Skladal, P; Zajickova, L, 2016: . SURFACE & COATINGS TECHNOLOGY 290, p. 116 - 123, doi: 10.1016/j.surfcoat.2015.09.035
(R2-PECVD) -
ŠTRBKOVÁ, L.; MANAKHOV, A.; ZAJÍČKOVÁ, L.; STOICA, A.; VESELÝ, P.; CHMELÍK, R., 2016: . SURFACE AND COATINGS TECHNOLOGY 295, p. 70 - 8, doi: 10.1016/j.surfcoat.2015.10.076; FULL TEXT
(R2-PECVD) -
Manakhov, A; Necas, D; Cechal, J; Pavlinak, D; Elias, M; Zajickova, L, 2015: . THIN SOLID FILMS 581, p. 7 - 13, doi: 10.1016/j.tsf.2014.09.015
(R2-PECVD) -
Muresan, MG; Campbell, AC; Ondracka, P; Bursikova, V; Perina, V; Polcar, T; Reuter, S; Hammer, MU; Valtr, M; Zajickova, L, 2015: . SURFACE & COATINGS TECHNOLOGY 272, p. 229 - 238, doi: 10.1016/j.surfcoat.2015.04.002
(R2-PECVD)
Photogallery
Specification
| CCP 13.56 MHz | max. power 600 W |
|---|---|
| Sample size: | up to 10" |
| Gases: | Ar, O2 |
| Monomers: | cyclopropylamine |
| Processes: | deposition of bioactive thin films plasma treatment and etching |
Documents
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+420 54114 9207
nano@ceitec.vutbr.cz
