Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 (HELIOS)


Guarantor:
Ondřej Man, Ph.D.

Instrument status:
Operational Operational, 19.3.2024 08:39

Equipment placement:
CEITEC Nano - A1.10


FEG-type scanning electron microscope with High/Low vacuum regime with resolution at least 1,5 nm @ 15 kV (in high vacuum mode) and with chamber allowing XY stage travel at least 100x100 mm. Equipped with analytical attachments EDS + WDS + EBSD.


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Specification

Electron column/optics specifications

Electron column type
Elstar UC
Electron source typeSchottky FEG with monochromator
Imaging modesfield free
XHR immersion
EDS optimized
Beam deceleration (stage bias – 20 V to – 4 kV
Probe current0.8 pA to 100 nA
Landing energy20 eV to 30 keV

Ion column/optics specifications

Ion column typeTomahawk
Ion source typeGa LMIS
Probe current0.1 pA to 65 nA
Landing energy500 eV to 30 keV

Detectors available

Imaging detectorsAnalytical detectorsOthers
in-lens SE detector (TLD-SE)energy dispersive spectrometer (EDS)IR camera for viewing sample/column
in-lens BSE detector (TLD-BSE)electron backscatter diffraction detector (EBSD)Chamber mounted Nav-Cam+
in-column SE detector (ICD)
Integrated beam current measurement
in-column BSE detector (MD)
Everhart-Thornley SE detector (ETD)
forward-scattered electrons detector (FSD)
Retractable low voltage, solid-state backscatter electron detector (DBS)
Retractable STEM detector with BF/DF/HAADF segments
Secondary electrons/ions detector (ICE)

Resolution


Top resolutionConditions
e-beam0.6 nm30 kV (STEM)
0.6 nm15 – 2 kV
0.7 nm1 kV
1.0 nm500 V (ICD)
i-beam4 nm30 kV

Sample stage

Stage typeHigh precision 5-axes motorized stage
AxisMaximum movement [mm]
X, Y150 (piezo driven)
Z10
tilt– 10 ° to + 60 °
rotation360 ° continuous
Positioning accuracy/repe­atability
X, Y repeatability 1 μm
Compucentric rotation and tilt
tilt accuracy 50° – 54°0.1°

Maximum sample sizes

Maximum size150 mm diameter with full rotation
Maximum sample thickness (via loadlock)ca 9 mm incl. holder (must go through circular opening of a valve)
Maximum sample thickness (via chamber door)ca 55 mm incl. sample holder
Weight500 g (incl. holder)
Please avoid introduction of your samples via chamber door as much as possible!

Gas injection system

Number of GIS channels installed2
Type of precursors availableCarbon, Tungsten

Micromanipulator

Manipulator typeEasyLift EX (FEI)
Available movementsX, Y, Z, rotation

Installed utility devices

Plasma cleaner (mounted on the chamber)
Cryo cleaner (mounted on the chamber)
Manual loadlock („Quick loader“)
Additional cold trap (to be used with CryoMAT)

Special stage option

Stage typeCryoMAT (FEI)
Working temperature range– 190 °C to + 50 °C
Sample size limitations
Max. sample diameter10 mm
Max. sample thickness5 mm
Special sample shuttle and stubs have to be used!

Analytical detectors specifications

DetectorParameterSpecified value
EDSDetector typeEDAX SDD Octane Super
Detector chip area60 mm2
Energy resolution-specified129 eV @ MnKα
Energy resolution-measured129.5 eV @ MnKα

EBSDDetector typeEDAX Hikari XP
Detector camera resolution640 (H) x 480 (V) x 14 bits
Adjustable gain0 – 35 dB
Data collection rateup to 650 indexed pps
Minimum operational voltage5 kV
Minimum beam current100 pA


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