Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 (HELIOS)


Guarantor:
Ondřej Man, Ph.D.

Instrument status:
Operational Operational, 3.7.2020 18:25

Equipment placement:
CEITEC Nano - A1.10


FIB/SEM with sub-nm resolution, capable of imaging at very low landing energies of primary electrons (of the order of tens of volts), in-lens detection of SE and BSE, local chemical analysis. Equipped with STEM detector and EDS + EBSD analysers. Ideally suited for TEM lamella preparation and observation. Capable of 3D chemical and crystallographic analysis as well as structure reconstruction.


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Specification

Electron column/optics specifications

Electron column type Elstar UC
Electron source type Schottky FEG with monochromator
Imaging modes field free
XHR immersion
EDS optimized
Beam deceleration (stage bias – 20 V to – 4 kV
Probe current 0.8 pA to 100 nA
Landing energy 20 eV to 30 keV

Ion column/optics specifications

Ion column type Tomahawk
Ion source type Ga LMIS
Probe current 0.1 pA to 65 nA
Landing energy 500 eV to 30 keV

Detectors available

Imaging detectors Analytical detectors Others
in-lens SE detector (TLD-SE) energy dispersive spectrometer (EDS) IR camera for viewing sample/column
in-lens BSE detector (TLD-BSE) electron backscatter diffraction detector (EBSD)
Chamber mounted Nav-Cam+
in-column SE detector (ICD)
Integrated beam current measurement
in-column BSE detector (MD)
Everhart-Thornley SE detector (ETD)
forward-scattered electrons detector (FSD)
Retractable low voltage, solid-state backscatter electron detector (DBS)
Retractable STEM detector with BF/DF/HAADF segments
Secondary electrons/ions detector (ICE)

Resolution


Top resolution Conditions
e-beam 0.6 nm 30 kV (STEM)
0.6 nm 15 – 2 kV
0.7 nm 1 kV
1.0 nm 500 V (ICD)
i-beam 4 nm 30 kV

Sample stage

Stage type High precision 5-axes motorized stage
Axis Maximum movement [mm]
X, Y 150 (piezo driven)
Z 10
tilt – 10 ° to + 60 °
rotation 360 ° continuous
Positioning accuracy/repe­atability
X, Y repeatability 1 μm
Compucentric rotation and tilt
tilt accuracy 50° – 54° 0.1°

Maximum sample sizes

Maximum size 150 mm diameter with full rotation
Maximum sample thickness (via loadlock) ca 9 mm incl. holder (must go through circular opening of a valve)
Maximum sample thickness (via chamber door) ca 55 mm incl. sample holder
Weight 500 g (incl. holder)
Please avoid introduction of your samples via chamber door as much as possible!

Gas injection system

Number of GIS channels installed
2
Type of precursors available Carbon, Tungsten

Micromanipulator

Manipulator type EasyLift EX (FEI)
Available movements X, Y, Z, rotation

Installed utility devices

Plasma cleaner (mounted on the chamber)
Cryo cleaner (mounted on the chamber)
Manual loadlock („Quick loader“)
Additional cold trap (to be used with CryoMAT)

Special stage option

Stage type CryoMAT (FEI)
Working temperature range – 190 °C to + 50 °C
Sample size limitations
Max. sample diameter 10 mm
Max. sample thickness 5 mm
Special sample shuttle and stubs have to be used!

Analytical detectors specifications

Detector Parameter Specified value
EDS Detector type EDAX SDD Octane Super
Detector chip area 60 mm2
Energy resolution-specified 129 eV @ MnKα
Energy resolution-measured 129.5 eV @ MnKα

EBSD Detector type EDAX Hikari XP
Detector camera resolution 640 (H) x 480 (V) x 14 bits
Adjustable gain 0 – 35 dB
Data collection rate up to 650 indexed pps
Minimum operational voltage 5 kV
Minimum beam current 100 pA

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