CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
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UHV Preparation and Analytical System - Pulsed Laser Deposition TSST (UHV-PLD)
Guarantor:
Adam Dubroka, Ph.D.
Instrument status:
Non Operational, 22.12.2025 16:55, The IR Heater Laser-module error. The laser heating is turning OFF after 4-5 min of heating. The ´E038 error: temperature cooling plate 1 too high´ appears.
Equipment placement:
CEITEC Nano - C1.38
The pulsed laser deposition preparation chamber (UHV-PLD) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The UHV-PLD is used for the preparation of oxide-based layers, it provides a possibility of epitaxial growth of oxide heterostructures, ozone-assisted growth, and masking option. It is equipped with a UV-laser 248nm 700mJ 10Hz, high-precision RHEED, sample heating by IR laser, and independent load-lock.
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