Cross section/broad beam ion polisher Leica EM TIC3X (TIC3X)


Cross section/broad beam ion polisher Leica EM TIC3X

Guarantor:
Ondřej Man, Ph.D.

Instrument status:
Operational Operational, 19.10.2023 10:57

Equipment placement:
CEITEC Nano - A1.08


Device for ion polishing samples for scanning electron microscopy beam of light ions, enabling the creation of precise cross sections fragile, heterogeneous, porous and temperature sensitive materials for their studies by scanning electron microscopy and analytical methods EBSD, EDS and WDS. Furthermore, the instrument allows ion polishing large surfaces at oblique incidence of the ion beam for studying the foregoing materials mentioned methods.


Publications:

Photogallery

Specification

Ion source

Ion sourceTriple ion source, single controllable guns
Ion energy1 keV to 10 keV
Source current0.5 to 4.5 mA / 0.1 mA stepsize (per ion source)
Ion current density10 mA/cm² (per ion source)
Ion beam diameter (FWHM)0.8 mm (at 10 keV), 2.5 mm (at 2 keV)
GasArgon, minimal purity 99.999 % (Ar 5.0)

Sample stages

Cooling stage for cross section polishing
temperature range
from +30 to –150 °C ±5 °C
warm-up temperature
from +1 to +50 °C
sample sizeup to 25 × 20 mm x 5 mm (thick)
stage movement
x-direction: ±5 mm; y: ±1 mm; z: 6 mm


Multiple sample stage
number of samples per batch
up to 3 in separate holders
maximum sample size

10 x 10 x 6 mm

(thickness 6 mm achievable using different holders 0 - 3 mm and 2,5 - 6 mm)

stage movement
x-direction: 0 mm; y: ±1 mm; z: 4 mm; rotary oscillation: ±5 °

 

Standard stage for cross section polishing
sample size
up to 50 × 50 mm x 5 to 10 mm (thick)
Mask position accuracy< ±2 μm
Cutting area
Depth > 1 mm, Width > 4 mm
stage movement
x-direction: ±5 mm; y: ±1 mm; z: 6 mm
 
Rotary stage for planar polishing
max. sample sizeØ 38mm / 12mm thick
max. ion beam polished areaØ 25mm (for sample diameter of 25mm)
max. lateral movement settings
sample Ø 38mm± 3mm
sample Ø 35mm± 5mm
sample Ø 33mm± 6mm
sample Ø 30mm± 8mm
sample Ø 28mm± 9.5mm
sample Ø 25mm± 11.5mm
sample < Ø 20mm± 12.5mm
ion beam incident angle settings (1.5° increments)
sample Ø 38mm0° – 12°
sample Ø 35mm0° – 13°
sample Ø 33mm0° – 14°
sample Ø 30mm0° – 15°
sample Ø 28mm0° – 16°
sample Ø 25mm0° – 18°
sample Ø 23mm0° – 36°
sample < Ø 20mm0° – 48°
lateral speed setting0.1 – 2mm/s
rotation speed settingLow (~2rpm)
Medium (~6rpm)
High (~10rpm)
Cross sectioning adaptor for rotary stage
max. sample size
Width = 10 mm; Height = 7 mm; Thickness = 4 mm
max. angle of attack of ion beams
0 ° - 12 °
available stage movements

X, Y, Z = 0 mm

NO rotation, only oscillation ± 45 ° maximum

 


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