Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)


Guarantor:
Josef Polčák, Ph.D.

Instrument status:
Operational Operational, 30.10.2024 16:29

Equipment placement:
CEITEC Nano - C1.38


The chamber for sample heating and sputtering (UHV-Preparation) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. It provides the possibility of:
- cleaning and basic preparation of the surfaces of the substrates,
- ion sputtering (Ar ions) and annealing (e-beam heating, direct current heating – for clean Si only).
It as well provides the possibility to build-in custom components.


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