Services for academic users
Who's eligible for academic prices?
- The self-service or full-service users must prove affiliation with an academic institution.
- The user agrees that the results will only be used for independent research purposes and will not be disclosed or sold to third parties.
If you are from the commercial sector, please visit the web section about our services for commercial users.
Acknowledgement: In the case of publication of the results achieved in the CEITEC Nano Research Infrastructure, acknowledge its use in all the publications resulting from the work done here, as instructed at http://nano.ceitec.cz/acknowledgement/.
Authorship policy: Please note that the type of service has no influence on authorship policy, and any form of paid service is not a waiver for ignoring authorship. All contributors who have made substantive intellectual contributions to a paper should be given an opportunity to be given credit as authors regardless of financial arrangement. http://nano.ceitec.cz/authorship-policy-at-ceitec-nano/
Extending/renewing access: Please do not forget to fill in the original User Fee Agreement and Solemn Declaration (same as a new user) and send/bring them to us together with the list of publications, including Acknowledgement to CEITEC Nano RI.
Should you wish to undertake a commercial project as part of your academic access, please contact us to obtain the exact terms on which this is possible at nano@ceitec.vutbr.cz.
1. Academic Self-service users
The preferred way for academic users to use the equipment at CEITEC Nano Research Infrastructure is through self-service open access. The instrument running cost is 100% covered by CEITEC Nano, and only the administration and training fees are paid by the user.
Access to all CEITEC Nano equipment via the booking system | CZK (without VAT) | EUR (without VAT) |
The user fee for self-service users (valid from 1st January 2024) | 40,000/year | approx. 1,633/year |
Self-service users gain full independent access to all CEITEC Nano labs and access to all instruments via the booking system. Authorization to work on individual instruments is required and can be obtained after proper training.
1. Register via the Perun website – https://idm.ics.muni.cz/ceitec/registrar/?vo=ceitec&group=CEITECNANO
(We will accept your registration after receiving your User Fee Agreement & Solemn Declaration)
2. Print the CEITEC Nano User fee agreement & Solemn declaration and sign it. If you have a faculty advisor and/or sponsor, have them sign it as well. Bring the agreement to the User office C1.04 or scan and email it to nano@ceitec.vutbr.cz.
3. Thoroughly study the CEITEC Nano User Manual, then pass the exam (see Training->General training).
- Wait to receive an email (this can take up to 5 working days) that shows your score and whether or not you passed the exam. Please note: You need to be registered via the Perun website to get the access link to the online test - see No. 1
- If you do not pass the exam, you can correct it and resubmit it on the CEITEC Nano User Manual Exam page.
4. Contact the CEITEC Nano User Office to schedule a laboratory safety excursion. The CEITEC Nano User Office can be reached via email at nano@ceitec.vutbr.cz or by phone 54114 9206.
a) “Handling of toxic and dangerous chemical substances” training – mandatory for all users who will be in contact with dangerous chemical compounds/solutions (for example HF) – the course is available for all registered users in Moodle (the Czech version is also available there).
b) Safety excursions – five options are available:
- Full CEITEC Nano excursion – 2 hrs.
- Nanofabrication laboratory – 45 min. (Nanofab Interview and Questionnaire are required.)
- Nanocharacterization laboratory – 30 min.
- Structural analysis laboratory – 30 min.
- Chemical laboratory in building B – 20 min. (before the safety excursion, the Moodle course is needed)
5. After you have completed all of the access requirements, you can start with the training for individual equipment.
6. During the period of your work in CEITEC Nano RI, you are obliged to send us your publications (thesis, papers, articles…) and other scientific outcomes (posters, presentations…) by email to nano@ceitec.vutbr.cz (PDF file) with Acknowledgement to CEITEC Nano RI. If you have not published any outcomes over the past year and you are going to prolong your access to the RI, please fill in the CEITEC Nano activity report and submit it with the new User fee agreement.
Extending/renewing access: Please do not forget to fill in the original User Fee Agreement & Solemn Declaration (same as a new user) and send/bring them to us together with the list of publications, including Acknowledgement to CEITEC Nano RI.
2. Full-services for academic users
For occasional users, where training is unfeasible, full-service processing of user’s samples can be provided by CEITEC Nano staff. Full-service users do not need any training, their samples are handled by CEITEC Nano staff. They can be present at the measurement only as visitors under the supervision of authorized personnel.
How to order full-service
- Contact the CEITEC Nano User Office at nano@ceitec.vutbr.cz or via phone at 54114 9200 to discuss your processing requirements.
- The CEITEC Nano financial department will send you a quotation for CEITEC Nano services. We provide support regarding internal invoicing from projects running at CEITEC and BUT. Contact CEITEC Nano financial manager Kateřina Tydlačková (+420 54114 9205) with your questions.
- If you agree with the quotation, send the purchase order to nano@ceitec.vutbr.cz
- CEITEC Nano staff will process your samples and prepare a processing/measurement report.
- Upon agreement, an invoice will be emailed to you together with the samples or measurement data.
Prices for academic users
Valid from 1st April 2023.
Academic users using the full-service pay hourly rates (listed below - VAT is not included) for the instrument use and an additional fee for the analysis of the results (if requested).
CEITEC Nano pricelist* - full service for Academic users | |||
---|---|---|---|
Nanofabrication Laboratory | |||
Lithography | CZK/hour | EUR/hour | |
RAITH | E-beam writer RAITH150 Two | 2 200 | 95 |
MIRA | Scanning Electron Microscope/E-beam writer TESCAN MIRA3 | 1 600 | 70 |
DWL | UV Direct Write Laser system Heidelberg Instruments DWL 66-fs | 1 600 | 70 |
SUSS-MA8 | Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 | 1 600 | 70 |
SUSS-WETBENCH | Lithographic wetbench for resist coating SÜSS MicroTec | 1 600 | 70 |
SUSS-RCD8 | Resist coating and development system SÜSS MicroTec RCD8 | 1 600 | 70 |
LAURELL | Spincoater Laurell WS-650-23B | 1 200 | 50 |
NANOCALC | Spectroscopic reflectometer Ocean Optics NanoCalc 2000 | 1 200 | 50 |
DEKTAK | Mechanical profilometer Bruker Dektak XT | 1 600 | 70 |
DIENER | Resist stripper Diener electronic NANO Plasma cleaner | 1 600 | 70 |
FUMEHOOD | Fumehoods for organic solvents and Fumehoods for corrosive liquids | 1 200 | 50 |
Depositions and etching | CZK/hour | EUR/hour | |
EVAPORATOR | Electron beam evaporator BESTEC | 1 600** | 70** |
MAGNETRON | Magnetron sputtering system BESTEC | 1 600** | 70** |
ALD | Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 | 1 600 | 70 |
XEF2 | XeF2 etching system | 1 600 | 70 |
PARYLENE | SCS Parylene Deposition System | 1 600 | 70 |
PECVD-NANOFAB | High-temperature PECVD of C-based materials Oxford Instruments Plasma Technology NanoFab | 1 600 | 70 |
Experimental-PECVD | PECVD with ion and mass analyzer, optical emission spectroscopy, in situ ellipsometry, langmuir probe | 1 600 | 70 |
APCVD | Atmospheric Pressure chemical vapor deposition | 1 600 | 70 |
LPCVD | Low-pressure chemical vapor deposition | 1 600 | 70 |
MOCVD | Metal-organic chemical vapor deposition | 1 600 | 70 |
PECVD | PECVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 1 600 | 70 |
DRIE | Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 1 600 | 70 |
SCIA | Ion beam etching Scia Systems Coat 200 | 1 600 | 70 |
RIE-CHLORINE | Reactive ion etching of III-V semiconductors Oxford Instruments Plasma Technology PlasmaPro 100 | 1 600 | 70 |
RIE-FLUORINE | RIE of Si-based materials/deposition of thin films Oxford Instruments PlasmaPro NGP 80 | 1 600 | 70 |
Packaging | CZK/hour | EUR/hour | |
WIRE-BONDER | Wire bonder TPT HB 16 | 1 200 | 50 |
LASER-DICER | Laser dicer Oxford Lasers A-Series | 1 200 | 50 |
LEICACOAT-NANO | High vacuum coating system for electron microscopy Leica Microsystems EM ACE 600 | 1 200** | 50** |
DICING-SAW | Semiautomatic dicing saw ESEC 8003 | 1 200 | 50 |
CPD | Critical Point Dryer – Tousimis Autosamdri-815B | 1 200 | 50 |
Nanocharacterization laboratory | |||
UHV Technologies | CZK/hour | EUR/hour | |
SIMS | Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5 | 2 200 | 95 |
KRATOS-XPS | X-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra | 2 200 | 95 |
NANOSAM | nanoScanning Auger Microscopy Scienta Omicron nanoSAM Lab | 2 200 | 95 |
UHV-CLUSTER | Ultra-High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS | 2 200 | 95 |
Microscopy and nanomanipulation | CZK/hour | EUR/hour | |
LYRA | Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 | 1 600 | 70 |
MIRA-STAN | Scanning electron microscope (SEM) MIRA3 XMU | 1 600 | 70 |
ICON-SPM | Scanning Probe Microscope Bruker Dimension Icon | 1 600 | 70 |
LEXT | Confocal Laser Scanning Microscope Olympus Lext OLS4100 | 1 600 | 70 |
NANOWIZARD | Atomic force microscope JPK Nanowizard | 1 600 | 70 |
RAMAN | Witec Alpha 300R | 1 600 | 70 |
NANOSCAN | NanoScan VLS-80 | 1 600 | 70 |
KERR-MICROSCOPE | Magneto-optical Kerr microscope | 1 200 | 50 |
NANOINDENTOR | Hysitron TI 950 | 1 600 | 70 |
Optical measurements | CZK/hour | EUR/hour | |
FTIR | Vacuum FTIR Vertex80v + microscope Hyperion 3000 KIT | 1 600 | 70 |
WOOLLAM-VIS | NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE | 1 200 | 50 |
WOOLLAM-MIR | MIR spectroscopic ellipsometer J. A. Woollam IR-VASE | 1 600 | 70 |
VUVAS | Vacuum ultraviolet spectrometer McPherson VUVAS 1000 | 1 600 | 70 |
NIRQUEST512 | NIR Optical Spectrometer Ocean Optics NIRQuest 512 | 1 200 | 50 |
JAZ3 | UV-VIS Optical Spectrometer Ocean Optics JAZ 3-channel | 1 200 | 50 |
SNOM-NANONICS | Scanning Near-field Optical Microscopy Nanonics Imaging MV 4000 | 1 600 | 70 |
TERS | Scanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar II | 1 600 | 70 |
Electrical and magnetic measurements | CZK/hour | EUR/hour | |
SUMMIT | Semi-automated 4-probe system Cascade Microtech SUMMIT 12000 | 1 600 | 70 |
MPS150 | 4-probe station Cascade Microtech MPS 150 | 1 200 | 50 |
KEITHLEY | Keithley 4200-SCS Parameter Analyzer | 1 200 | 50 |
VERSALAB | Cryogenic-free VSM and ETO measurement system – Quantum Design, VersaLab | 1 200 | 50 |
LAKESHORE | Low-Temperature Electro-Magnetic Properties Measurement System LakeShore CRX-EM-HF | 1 600 | 70 |
CRYOGENIC | Low-Temperature Vibrating Sample Magnetometer Cryogenic Limited | 1 600 | 70 |
Structural analysis laboratory | |||
Electron microscopy | CZK/hour | EUR/hour | |
TITAN | High resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed | 2 800 | 120 |
HELIOS | Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 | 2 200 | 95 |
VERIOS | High-resolution Scanning Electron Microscope FEI Verios 460L | 2 200 | 95 |
Sample preparation | CZK/hour | EUR/hour | |
STEMI | Stereomicroscope Zeiss Stemi 508 | 1 200 | 50 |
TENUPOL | TEM electrolytic polisher Tenupol 5 | 1 200 | 50 |
US-CUTTER | Ultrasonic TEM disc cutter Fischione 170 | 1 200 | 50 |
CITOVAC | Vacuum impregnation chamber Citovac | 1 200 | 50 |
LEICACOAT | Coater Leica EM ACE600 | 1 200** | 50** |
TXP | Target surfacing system Leica TXP | 1 200 | 50 |
TIC3X | Cross-section/broad beam ion polisher Leica EM TIC3X | 1 200 | 50 |
DIMPLING-GRINDER | Dimple grinder Fischione 200 | 1 200 | 50 |
LECTROPOL | Electrolytic polisher Lectropol 5 | 1 200 | 50 |
TEGRAMIN | Grinder/polisher Tegramin 30 | 1 200 | 50 |
ZEISS-STAN | Inverted light microscope Zeiss Axio Observer Z1m | 1 200 | 50 |
FISCHIONE-TEM-MILL | Ion polisher Fischione TEM Mill 1050 | 1 200 | 50 |
LABOTOM5 | Metallographic saw Labotom 5 | 1 200 | 50 |
CITOPRESS | Mounting press Citopress 10 | 1 200 | 50 |
PLASMACLEANER | Plasma cleaner Fischione 1020 | 1 200 | 50 |
SAW-ACCUTOM | Precision saw Accutom 100 | 1 200 | 50 |
X-ray diffractometry | CZK/hour | EUR/hour | |
RIGAKU9 | X-ray diffractometer with high brightness source Rigaku SmartLab 9kW | 1 600 | 70 |
RIGAKU3 | X-ray powder diffractometer Rigaku SmartLab 3kW | 1 600 | 70 |
Micro & Nano X-ray CT laboratory | CZK/hour | EUR/hour | |
microCT | microCT GE phoenix v|tome|x L240 | 4 000 | 165 |
nanoCT | nanoCT Rigaku nano3DX | 3 500 | 145 |
Laser Spectroscopy laboratory | CZK/hour | EUR/hour | |
LIBS | Laser-Induced Breakdown Spectroscopy | 3 500 | 145 |
Thermogravimetric analysis | CZK/hour | EUR/hour | |
TGA96 | TGA96Line | 1 600 | 70 |
Consumables per analysis (gases, cups) | 600 | 25 | |
* Prices without VAT
** Au/Pt/Pd – 20 nm per deposition/sample is included in the user fee; every additional nanometer is 25 CZK/nm
Prices in EUR are approximately at the rate of 25 CZK = 1 EUR