Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

HARUMNINGTYAS, A.; ITO, T.; ISOBE, M.; ZAJÍČKOVÁ, L.; HAMAGUCHI, S., 2023: Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 41(6), doi: 10.1116/6.0002978; FULL TEXT

Research Groups:

• Plasma Technologies
• CF: CEITEC Nano

CEITEC authors:

• Lenka Zajíčková, Ph.D.