Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering

APPLIED SURFACE SCIENCE

MASCARETI, L.; BARMAN, T.; BRICCHI, BC.; MÜNZ, F.; LI BASSI, A.; KMENT, Š.; NALDONI, A., 2021: Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering. APPLIED SURFACE SCIENCE 554, p. 149543-1 - 9, doi: 10.1016/j.apsusc.2021.149543; FULL TEXT
(WOOLLAM-VIS)

Equipment:

• NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Filip Münz, Ph.D.