CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
Consumables | wh | ShP | i | feedback
LAURELL-SPIN COATER (LAURELL-NANO)
Guarantor:
Vojtěch Švarc, Ph.D.
Instrument status:
Operational, 14.4.2025 11:33, The sewage tube changed to the small sewage container - clean that after usage
Equipment placement:
CEITEC Nano - C1.30
The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5´ × 5´ (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).
Publications:
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FABBRI, L.; MIGLIACCIO, L.; ŠIRVINSKYTE, A.; RIZZI, G.; BONDI, L.; TAMAROZZI, C.; WEBER, S.; FRABONI, B.; GLOWACKI, E.; CRAMER, T., 2025: How to Achieve High Spatial Resolution in Organic Optobioelectronic Devices?. ADVANCED MATERIALS INTERFACES 12(9), p. 1 - 9, doi: 10.1002/admi.202400822; FULL TEXT
(DIENER, LAURELL-NANO)
Photogallery
Specification
| Sample size: | 5x5 mm^2 to 150 mm / 6 inch (125x125 mm^2) |
|---|---|
| Maximum rotation speed: | 12,000 RPM |
| Acceleration: | from 1 RPM increment |
| Instruments: |
Reusable process chamber liner, made from Teflon Wafer Alignment Tool Chucks and Adapters for samples with different size |
Documents
Here is place for your documents.