CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
Consumables | wh | ShP | i | feedback
LAURELL-SPIN COATER (LAURELL-NANO)
Guarantor:
Vojtěch Švarc, Ph.D.
Instrument status:
Operational, 27.6.2019 10:10
Equipment placement:
CEITEC Nano - C1.30
The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5´ × 5´ (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).
Photogallery
Specification
| Sample size: | 5x5 mm^2 to 150 mm / 6 inch (125x125 mm^2) |
|---|---|
| Maximum rotation speed: | 12,000 RPM |
| Acceleration: | from 1 RPM increment |
| Instruments: |
Reusable process chamber liner, made from Teflon Wafer Alignment Tool Chucks and Adapters for samples with different size |
Documents
Here is place for your documents.