Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)


Guarantor:
Josef Polčák, Ph.D.

Instrument status:
Operational Operational, 12.8.2024 17:01

Equipment placement:
CEITEC Nano - C1.38


The chamber for photoelectron spectroscopy analysis (UHV-XPS) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films.
The instrument is equipped with the Al Kα and Mg Kα X-ray sources which provide photons with 1486.6eV and 1254.6eV energy respectively and He I/II UV source providing photons with energies of 21.22eV and 40.81eV respectively. The photoelectrons are analyzed in a hemispherical detector in which lens voltages direct the electron onto a two-dimensional (energy, momentum) multi-channel plate allowing for angular-resolved photoelectron spectroscopy (ARPES) experiments.


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