Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)


Guarantor:
Josef Polčák, Ph.D.

Instrument status:
Operational Operational, 14.11.2023 14:56

Equipment placement:
CEITEC Nano - C1.38


The UHV-DEPOSITION - a multi-purpose chamber for the preparation of surfaces and thin layers (UHV-Deposition) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. It provides:
- the possibility of preparation of samples and of deposition of materials by thermal evaporation (e.g. metals, organics).
- calibration of deposition rates by a quartz microbalance.
- the possibility to mount custom components like effusion cells.
The chamber is equipped with an RF plasma source for atomic nitrogen and oxygen.
Equipment: sample heating by electron beam heater up to 1400 °C, sample cooling by L-N2, pyrometer for temperature measurement.


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