Critical Point Dryer – now available for users of CEITEC Nano
We have got new machine for you - CPD-Autosamdri-815B. It has been installed in the Photolithography Lab (CR Class 100) and is operational since 22nd Feb 2019. Well established method for wafer and MEMS drying. It reduces the effect of deformation and shrinkage that occur when drying samples by conventional evaporation. Available for 5 (4", 3", 2") wafers, sample basket for 1cm2 samples. To get training for CPD please contact Jiří Zita.