Magnetron sputtering system BESTEC (MAGNETRON)


Guarantor:
Jan Prášek, Ph.D.

Instrument status:
Operational Operational, 22.3.2024 16:32, 6 targets exchange OK Standard cleaning Bakeout 48 h

Equipment placement:
CEITEC Nano - C1.36


The UHV physical vapor deposition system for DC and RF thin-film sputtering deposition (mostly the metals) which utilizes strong electric and magnetic fields to increase the deposition yield. The eight sputtering target system has a reactive gas inlet for reactive deposition of oxides and nitrides as well. The substrate can be heated up to 800 °C.


Publications:

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Photogallery

Rules for long term reservation

Magnetron can be booked for several days in a row, if necessary up to 4 days in 14 days. During the booked period, you will have a magnetron for yourself and no one else will be able to use it. If you find that your reservation is no longer needed, cancel it in the reservation system and inform other users. The use of the reserved time on the magnetron will be controlled by both guarantors & users.

Specification

3 DC sources power up to 500W
1 RF source power up to 300W
8 targetsW, Au, FeRh, Pt, Co, Ta, Al, Ti
please check the Loggbook for current targets in Magnetron
loadlockYES
sample size up to 4”
rotation of substrateYES
substrate temperature RT – 800 °C
gas line for reactive depositionO2 or N2
standard materialsAg, Al, Au, B, Bi, C, Co, Cr, Cu, Gd, Fe, Hf, Mo, Mn, Nb, Ni, Pt, Ru, Si, Sb, Sc, Ta, Ti, W, Zr, TiN, TiO2, AlCuSi, NiCr, Ni80Fe20, Ir20Mn80, Fe75Co25, Fe50Rh50, Al2O3, SiO2, Co20Fe60B20
Additional cost Au + Pt

​Self-service users have 15 nm of Pt and Au for free - everything above is 15 CZK/nm

Full-service cost is 15 CZK/nm for academic and 20 CZK/nm for commercial projects


Documents

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