Substrate-temperature-driven phase stabilization and strain modulation in BiFeO₃/Ti/Si heterostructures for scalable silicon integration
Journal of Alloys and Compounds
Fawaeer, S. H.; Al-Qaisi, W. M.; Sedláková, V.; Mousa, M. S.; Knápek, A.; Sobola, D., 2025: Substrate-temperature-driven phase stabilization and strain modulation in BiFeO₃/Ti/Si heterostructures for scalable silicon integration. JOURNAL OF ALLOYS AND COMPOUNDS 1047, doi: 10.1016/j.jallcom.2025.184949; FULL TEXT
(VERIOS, KRATOS-XPS, ICON-SPM, WOOLLAM-VIS)
Equipment:
- High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
- X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
- Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
- NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)
Research Groups:
CEITEC authors:
+420 54114 9207
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