CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
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Services for commercial users
Full-services for commercial users
Commercial users typically order measurement/nanofabrication services and their samples are processed by CEITEC Nano staff. They can be present at the measurement as visitors under the supervision of authorized personnel.
How to order full-service
- Contact the CEITEC Nano at nano@ceitec.vutbr.cz or via phone at 54114 9207 to discuss your processing requirements.
- The CEITEC Nano will send you a quotation for the services.
- If you agree with the quotation, send the purchase order to nano@ceitec.vutbr.cz
- CEITEC Nano staff will process your samples and prepare a processing/measurement report.
- Upon agreement, an invoice will be emailed to you together with the samples or measurement data.
If you have any questions regarding the invoices, please contact CEITEC Nano financial manager Kateřina Tydlačková (+420 54114 9205).
Access for self-service commercial users
If required, self-service access to all CEITEC Nano equipment is also available to commercial users. Commercial users pay a User fee (40,000 CZK/year), plus they pay an hourly charge which includes full instrument running costs, instrument depreciation and CEITEC Nano training and processing fees. See the full CEITEC Nano price list.
Also, we do provide short-term cleanroom laboratory rent for commercial purposes.
Please contact us at nano@ceitec.vutbr.cz to discuss your individual needs and pricing.
Prices for commercial users
Valid from 1st April 2023.
The prices include full instrument running costs, operator’s wage, instrument depreciation and CEITEC Nano processing fee. Contact CEITEC Nano User Office at nano@ceitec.vutbr.cz for a quotation.
CEITEC Nano pricelist* - full service for Commercial users | |||
|---|---|---|---|
Nanofabrication Laboratory | |||
Lithography | CZK/hour | EUR/hour | |
| RAITH | E-beam writer RAITH150 Two | 3 800 | 160 |
| MIRA | Scanning Electron Microscope/E-beam writer TESCAN MIRA3 | 3 400 | 140 |
| DWL | UV Direct Write Laser system Heidelberg Instruments DWL 66-fs | 2 800 | 115 |
| SUSS-MA8 | Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 | 3 900 | 165 |
| SUSS-WETBENCH | Lithographic wetbench for resist coating SÜSS MicroTec | 3 400 | 145 |
| SUSS-RCD8 | Resist coating and development system SÜSS MicroTec RCD8 | 3 200 | 135 |
| LAURELL | Spincoater Laurell WS-650-23B | 3 400 | 145 |
| NANOCALC | Spectroscopic reflectometer Ocean Optics NanoCalc 2000 | 2 600 | 110 |
| DEKTAK | Mechanical profilometer Bruker Dektak XT | 2 900 | 120 |
| DIENER | Resist stripper Diener electronic NANO Plasma cleaner | 2 600 | 110 |
| FUMEHOOD | Fumehoods for organic solvents and Fumehoods for corrosive liquids | 2 600 | 110 |
Depositions and etching | CZK/hour | EUR/hour | |
| EVAPORATOR | Electron beam evaporator BESTEC | 4 300** | 180** |
| MAGNETRON | Magnetron sputtering system BESTEC | 3 800** | 160** |
| ALD | Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 | 3 600 | 150 |
| XEF2 | XeF2 etching system | 2 600 | 110 |
| PARYLENE | SCS Parylene Deposition System | 2 600 | 110 |
| PECVD-NANOFAB | High-temperature PECVD of C-based materials Oxford Instruments Plasma Technology NanoFab | 4 000 | 165 |
| Experimental-PECVD | PECVD with ion and mass analyzer and optical emission spectroscopy | 4 400 | 185 |
| APCVD | Atmospheric Pressure chemical vapor deposition | 3 400 | 140 |
| LPCVD | Low-pressure chemical vapor deposition | 3 400 | 140 |
| MOCVD | Metal-organic chemical vapor deposition | 3 800 | 160 |
| PECVD | PECVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 4 400 | 185 |
| DRIE | Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 4 000 | 170 |
| SCIA | Ion beam etching Scia Systems Coat 200 | 3 900 | 160 |
| RIE-CHLORINE | Reactive ion etching of III-V semiconductors Oxford Instruments Plasma Technology PlasmaPro 100 | 3 200 | 135 |
| RIE-FLUORINE | RIE of Si-based materials/deposition of thin films Oxford Instruments PlasmaPro NGP 80 | 4 200 | 175 |
Packaging | CZK/hour | EUR/hour | |
| WIRE-BONDER | Wire bonder TPT HB 16 | 2 600 | 105 |
| LASER-DICER | Laser dicer Oxford Lasers A-Series | 3 125 | 125 |
| LEICACOAT-NANO | High vacuum coating system for electron microscopy Leica Microsystems EM ACE 600 | 2 600** | 105** |
| DICING-SAW | Semiautomatic dicing saw ESEC 8003 | 3 000 | 120 |
| CPD | Critical Point Dryer – Tousimis Autosamdri-815B | 3 125 | 125 |
Nanocharacterization Laboratory | |||
UHV Technologies | CZK/hour | EUR/hour | |
| SIMS | Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5 | 4 900 | 205 |
| KRATOS-XPS | X-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra | 4 900 | 205 |
| NANOSAM | nanoScanning Auger Microscopy Scienta Omicron nanoSAM Lab | 4 900 | 205 |
| UHV-CLUSTER | Ultra-High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS | 3 400 | 140 |
Microscopy and nanomanipulation | CZK/hour | EUR/hour | |
| LYRA | Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 | 4 200 | 175 |
| MIRA3-XMU | Scanning electron microscope (SEM) MIRA3 XMU | 3 400 | 140 |
| ICON-SPM | Scanning Probe Microscope Bruker Dimension Icon | 3 600 | 150 |
| NANOSCAN | NanoScan VLS-80 | 3 600 | 150 |
| RAMAN | Witec Alpha 300R | 3 600 | 150 |
| KERR-MICROSCOPE | Magneto-optical Kerr microscope | 3 100 | 130 |
| NANOINDENTOR | Hysitron TI 950 | 3 800 | 160 |
Optical measurements | CZK/hour | EUR/hour | |
| FTIR | Vacuum FTIR Vertex80v + microscope Hyperion 3000 KIT | 4 300 | 180 |
| WOOLLAM-VIS | NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE | 3 100 | 130 |
| WOOLLAM-MIR | MIR spectroscopic ellipsometer J. A. Woollam IR-VASE | 3 300 | 135 |
| VUVAS | Vacuum ultraviolet spectrometer McPherson VUVAS 1000 | 2 900 | 120 |
| NIRQUEST512 | NIR Optical Spectrometer Ocean Optics NIRQuest 512 | 2 800 | 120 |
| JAZ3 | UV-VIS Optical Spectrometer Ocean Optics JAZ 3-channel | 2 800 | 120 |
| SNOM-NANONICS | Scanning Near-field Optical Microscopy Nanonics Imaging MV 4000 | 3 900 | 165 |
| TERS | Scanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar II | 3 700 | 155 |
Electrical and magnetic measurements | CZK/hour | EUR/hour | |
| SUMMIT | Semi-automated 4-probe system Cascade Microtech SUMMIT 12000 | 3 600 | 150 |
| MPS150 | 4-probe station Cascade Microtech MPS 150 | 2 700 | 110 |
| KEITHLEY | Keithley 4200-SCS Parameter Analyzer | 2 700 | 110 |
| VERSALAB | Cryogenic-free VSM and ETO measurement system – Quantum Design, VersaLab | 2 800 | 120 |
| LAKESHORE | Low-Temperature Electro-Magnetic Properties Measurement System LakeShore CRX-EM-HF | 3 600 | 150 |
| CRYOGENIC | Low-Temperature Vibrating Sample Magnetometer Cryogenic Limited | 3 800 | 155 |
Structural analysis laboratory | |||
Electron microscopy | CZK/hour | EUR/hour | |
| TITAN | High resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed | 7 200 | 300 |
| HELIOS | Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 | 4 900 | 205 |
| VERIOS | High-resolution Scanning Electron Microscope FEI Verios 460L | 4 200 | 175 |
Sample preparation | CZK/hour | EUR/hour | |
| STEMI | Stereomicroscope Zeiss Stemi 508 | 2 200 | 90 |
| TENUPOL | TEM electrolytic polisher Tenupol 5 | 2 600 | 110 |
| US-CUTTER | Ultrasonic TEM disc cutter Fischione 170 | 2 400 | 100 |
| CITOVAC | Vacuum impregnation chamber Citovac | 2 300 | 95 |
| LEICACOAT | Coater Leica EM ACE600 | 2 600** | 105** |
| TXP | Target surfacing system Leica TXP | 2 200 | 90 |
| TIC3X | Cross-section/broad beam ion polisher Leica EM TIC3X | 3 100 | 130 |
| DIMPLING-GRINDER | Dimple grinder Fichione 200 | 2 300 | 95 |
| LECTROPOL | Electrolytic polisher Lectropol 5 | 2 500 | 105 |
| TEGRAMIN | Grinder/polisher Tegramin 30 | 2 500 | 105 |
| ZEISS-STAN | Inverted light microscope Zeiss Axio Observer Z1m | 2 400 | 100 |
| FISCHIONE-TEM-MILL | Ion polisher Fischione TEM Mill 1050 | 3 300 | 140 |
| LABOTOM5 | Metallographic saw Labotom 5 | 2 600 | 105 |
| CITOPRESS | Mounting press Citopress 10 | 2 200 | 90 |
| PLASMACLEANER | Plasma cleaner Fischione 1020 | 2 700 | 115 |
| SAW-ACCUTOM | Precision saw Accutom 100 | 2 700 | 115 |
X-ray diffractometry | CZK/hour | EUR/hour | |
| RIGAKU9 | X-ray diffractometer with high brightness source Rigaku SmartLab 9kW | 3 800 | 160 |
| RIGAKU3 | X-ray powder diffractometer Rigaku SmartLab 3kW | 3 400 | 140 |
Micro & Nano X-ray CT laboratory | CZK/hour | EUR/hour | |
| microCT | microCT GE phoenix v|tome|x L240 | 4 000 | 160 |
| nanoCT | nanoCT Rigaku nano3DX | 3 500 | 145 |
Laser Spectroscopy laboratory | CZK/hour | EUR/hour | |
| LIBS | Laser-Induced Breakdown Spectroscopy | 3 500 | 145 |
* Prices without VAT
** Au/Pt/Pd – 30 CZK/nm for every deposition tool
Prices in EUR are approximately at the rate of 25 CZK = 1 EUR