Self-compensating method for bolometer–based IR focal plane arrays

Pekárek, J.; Prokop, R.; Svatoš, V.; Gablech, I.; Hubálek, J.; Neužil, P., 2017: . SENSORS AND ACTUATORS, A: PHYSICAL 265, p. 40 - 46, doi: 10.1016/j.sna.2017.08.025
(SUSS-MA8, EVAPORATOR, RIE-FLUORINE, SUMMIT, SCIA)

Equipment:

• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• Electron beam evaporator BESTEC (EVAPORATOR)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Semi-automated 4-probe system Cascade Microtech SUMMIT 12000 (SUMMIT)
• Ion beam etching Scia Systems Coat 200 (SCIA)

Research Groups:

• CF: CEITEC Nano