Refined Epitaxial Growth of YbRh2Si2 Thin Films

ADVANCED MATERIALS INTERFACES

ISCERI, S.; NGUYEN, D.; PROKOFIEV, A.; SVAGERA, R.; WAAS, M.; BUTERA, V.; FISCHER, L.; RASOULI, S.; NAZZARI, D.; LAUDANI, F.; HANKE, M.; GIPARAKIS, M.; BAKALI, E.; KOLÍBALOVÁ, E.; MAN, O.; DETZ, H.; FOELSKE, A.; SCHRENK, W.; STRASSER, G.; PASCHEN, S.; ANDREWS, A., 2025: Refined Epitaxial Growth of YbRh2Si2 Thin Films. ADVANCED MATERIALS INTERFACES 12(21), p. 1 - 11, doi: 10.1002/admi.202500482; FULL TEXT
(VERIOS, HELIOS, TITAN)

Equipment:

• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 (HELIOS)
• High-resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed (TITAN)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC authors:

• Eva Kolíbalová, Ph.D.
• Ondřej Man, Ph.D.
• Hermann Detz