High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes

ACS APPLIED ELECTRONIC MATERIALS

SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7(13), p. 5889 - 9, doi: 10.1021/acsaelm.5c00351; FULL TEXT
(DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA)

Vybavení:

• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• Electron beam evaporator BESTEC (EVAPORATOR)
• Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Wire bonder TPT HB 16 (WIRE-BONDER)
• Witec Alpha 300R (WITEC-RAMAN)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)

Výzkumné skupiny:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC autoři:

• Linda Supalová
• Miroslav Bartošík, Ph.D.
• Vojtěch Švarc, Ph.D.
• Jindřich Mach, Ph.D.
• Ondřej Špaček
• Martin Konečný
• Prof. Tomáš Šikola
• Jakub Piastek, Ph.D.