Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating

GABLECH, I.; SOMER, J.; FOHLEROVÁ, Z.; SVATOŠ, V.; PEKÁREK, J.; KURDÍK, S.; FENG, J.; FECKO, P.; PODEŠVA, P.; HUBÁLEK, J.; NEUŽIL, P., 2018: . MICROFLUIDICS AND NANOFLUIDICS 22(9), p. NA - 7, doi: 10.1007/s10404-018-2125-6; FULL TEXT
(DRIE, DWL, SUSS-MA8, PARYLENE-SCS, XEF2)

Equipment:

• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• SCS Parylene Deposition System (PARYLENE-SCS)
• XeF2 Etching of Silicon (XEF2)

Research Groups:

• CF: CEITEC Nano
• Advanced Ceramic Materials

CEITEC authors:

• Peter Fecko
• Prof. Jaromír Hubálek, Ph.D.
• Prof. Pavel Neužil
• Jakub Somer
• Imrich Gablech, Ph.D.