Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing

SURFACE AND COATINGS TECHNOLOGY

KAUSHIK, P.; ELIÁŠ, M.; MICHALIČKA, J.; HEGEMANN, D.; PYTLÍČEK, Z.; NEČAS, D.; ZAJÍČKOVÁ, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 9, doi: 10.1016/j.surfcoat.2019.04.031; FULL TEXT
(ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, VERIOS, TITAN, KRATOS-XPS, RIGAKU3)

Equipment:

• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
• Electron beam evaporator BESTEC (EVAPORATOR)
• High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab (PECVD-NANOFAB)
• NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)
• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• High-resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed (TITAN)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• X-ray powder diffractometer Rigaku SmartLab 3kW (RIGAKU3)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Marek Eliáš, Ph.D.
• Jan Michalička, Ph.D.
• David Nečas, Ph.D.
• Lenka Zajíčková, Ph.D.