Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

VACUUM

KELAROVÁ, Š.; PŘIBYL, R.; HOMOLA, V.; POLČÁK, J.; CHARVÁTOVÁ CAMPBELL, A.; HAVLÍČEK, M.; VRCHOVECKA, K.; VÁCLAVÍK, R.; ZÁBRANSKÝ, L.; BURŠÍKOVÁ, V., 2023: Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures. VACUUM 207, doi: 10.1016/j.vacuum.2022.111634; FULL TEXT
(KRATOS-XPS, ICON-SPM)

Equipment:

• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• Bioelectronics Materials and Devices
• CF: CEITEC Nano

CEITEC authors:

• Josef Polčák, Ph.D.
• Dr. Marek Havlíček