Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates
Master´s Thesis
Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER´S THESIS , p. 1 - 96
(UHV-PREPARATION, UHV-XPS, UHV-SPM, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3, LYRA, ICON-SPM)
Equipment:
- Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
- Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)
- Ultra High Vacuum Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)
- High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
- Ultra High Vacuum Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100 (UHV-LEIS)
- X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
- X-ray powder diffractometer Rigaku SmartLab 3kW (RIGAKU3)
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
- Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
Research Groups: