Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties

APL MATERIALS

URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties. APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
(HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9, KERR-MICROSCOPE, LYRA, ICON-SPM)

Equipment:

• Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 (HELIOS)
• Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
• Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• X-ray diffractometer with high brightness source Rigaku SmartLab 9kW (RIGAKU9)
• Magneto-optical Kerr microscope (KERR-MICROSCOPE)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• Nanomagnetism and Spintronics
• CF: CEITEC Nano
• Fabrication and Characterisation of Nanostructures

CEITEC authors:

• Michal Urbánek, Ph.D.
• Michal Horký