Low-energy electron microscopy of graphene outside UHV: electron-induced removal of PMMA residues used for graphene transfer

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA

MATERNA MIKMEKOVÁ, E.; MÜLLEROVÁ, I.; FRANK, L.; POLČÁK, J.; SLUYTERMAN, S.; LEJEUNE, M.; KONVALINA, I., 2020: Low-energy electron microscopy of graphene outside UHV: electron-induced removal of PMMA residues used for graphene transfer. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA , p. 1 - 7, doi: 10.1016/j.elspec.2019.06.005; FULL TEXT
(KRATOS-XPS)

Equipment:

• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)

Research Groups:

• CF: CEITEC Nano
• Fabrication and Characterisation of Nanostructures

CEITEC authors:

• Josef Polčák, Ph.D.