Semiconductor nanowire growth utilizing alloyed catalyst

Master’s thesis

Musálek, T., 2016: Semiconductor nanowire growth utilizing alloyed catalyst. MASTER’S THESIS , p. 1 - 52
(UHV-MBE, VERIOS, MIRA-EBL, ALD, LYRA)

Equipment:

• Ultra High Vacuum Preparation and Analytical System - Molecular Beam Epitaxy SPECS (UHV-MBE)
• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)
• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)

Research Groups:

• CF: CEITEC Nano