Identical Fe-N4 Sites with Different Reactivity: Elucidating the Effect of Support Curvature

ACS Applied Materials & Interfaces

Jakub, Z.; Planer, J.; Hrůza, D.; Shahsavar, A.; Pavelec, J.; Čechal, J., 2025: Identical Fe-N4 Sites with Different Reactivity: Elucidating the Effect of Support Curvature. ACS APPLIED MATERIALS & INTERFACES 17(6), p. 10136 - 10144, doi: 10.1021/acsami.4c19913; FULL TEXT
(UHV-CLUSTER, UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS)

Equipment:

• UHV-CLUSTER (UHV-CLUSTER)
• Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
• Ultra High Vacuum Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)
• Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)

Research Groups:

• Molecular Nanostructures at Surfaces
• CF: CEITEC Nano

CEITEC authors:

• Zdeněk Jakub
• Jakub Planer
• Dominik Hrůza
• Prof. Jan Čechal, Ph.D.