Ambipolar remote graphene doping by low-energy electron beam irradiation

NANOSCALE

STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10(37), p. 17520 - 5, doi: 10.1039/c8nr06483k; FULL TEXT
(ALD, DIENER, DWL, EVAPORATOR)

Equipment:

• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
• Resist stripper Diener electronic NANO Plasma cleaner (DIENER)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Electron beam evaporator BESTEC (EVAPORATOR)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano
• Molecular Nanostructures at Surfaces

CEITEC authors:

• Veronika Stará
• Pavel Procházka, Ph.D.
• Prof. Tomáš Šikola
• Prof. Jan Čechal, Ph.D.