X-ray nanodiffraction analysis of residual stresses in polysilicon electrodes of vertical power transistors

MATERIALIA

Karner, S.; Blank, O.; Rösch, M.; Burghammer, M.; Zalesak, J.; Keckes, J.; Todt, J., 2022: X-ray nanodiffraction analysis of residual stresses in polysilicon electrodes of vertical power transistors. MATERIALIA 24, p. 101484-1 - 6, doi: 10.1016/j.mtla.2022.101484; FULL TEXT
(HELIOS)

Equipment:

• Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 (HELIOS)

Research Groups:

• CF: CEITEC Nano