Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

JOURNAL OF MATERIALS SCIENCE

GABLECH, I.; SVATOŠ, V.; CAHA, O.; HRABOVSKÝ, M.; PRÁŠEK, J.; HUBÁLEK, J.; ŠIKOLA, T., 2016: Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide. JOURNAL OF MATERIALS SCIENCE 51(7), p. 3329 - 8, doi: 10.1007/s10853-015-9648-y; FULL TEXT
(KAUFMAN, RIGAKU9, ICON-SPM)

Equipment:

• Ion-Beam Sputter Deposition System BESTEC (KAUFMAN)
• X-ray diffractometer with high brightness source Rigaku SmartLab 9kW (RIGAKU9)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano
• Biophotonics Core Facility

CEITEC authors:

• Jan Prášek, Ph.D.
• Prof. Jaromír Hubálek, Ph.D.
• Prof. Tomáš Šikola
• Ondřej Caha, Ph.D.
• Imrich Gablech, Ph.D.