Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn)

NANOSCALE

JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn). NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
(UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)

Equipment:

• UHV Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• UHV Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
• UHV Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
• UHV Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)

Research Groups:

• Molecular Nanostructures at Surfaces
• CF: CEITEC Nano

CEITEC authors:

• Zdeněk Jakub
• Pavel Procházka, Ph.D.
• Prof. Jan Čechal, Ph.D.
• Anna Kurowská