Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films

NEW JOURNAL OF PHYSICS

FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films. NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
(UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)

Equipment:

• UHV Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
• UHV Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)
• UHV Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100 (UHV-LEIS)
• UHV Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano
• Molecular Nanostructures at Surfaces

CEITEC authors:

• Pavel Procházka, Ph.D.
• Prof. Jan Čechal, Ph.D.
• Stanislav Průša, Ph.D.
• Ondřej Caha, Ph.D.