Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas

CHEMISTRY

Prochazka, P.; Frezza, F.; Sánchez-Grande, A.; Carrera, M.; Chen, QF.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Cechal, J., 2025: Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY 31(20), p. e20250056 - 6, doi: 10.1002/chem.202500561; FULL TEXT
(UHV-LEEM, UHV-SPM, UHV-DEPOSITION, UHV-PREPARATION)

Equipment:

• UHV Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
• UHV Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)
• UHV Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)

Research Groups:

• Molecular Nanostructures at Surfaces
• CF: CEITEC Nano

CEITEC authors:

• Pavel Procházka, Ph.D.
• Anna Kurowská
• Prof. Jan Čechal, Ph.D.
• Veronika Stará