Monitoring On‐Surface Chemical Reactions by Low‐Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas

Chemistry – A European Journal

Procházka, P.; Frezza, F.; Sánchez‐Grande, A.; Carrera, M.; Chen, Q.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Čechal, J., 2025: Monitoring On‐Surface Chemical Reactions by Low‐Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY – A EUROPEAN JOURNAL 31(20), p. 1 - 6, doi: 10.1002/chem.202500561; FULL TEXT
(UHV-LEEM, UHV-SPM, UHV-DEPOSITION, UHV-PREPARATION)

Equipment:

• Ultra High Vacuum Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
• Ultra High Vacuum Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)
• Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)

Research Groups:

• Molecular Nanostructures at Surfaces
• CF: CEITEC Nano

CEITEC authors:

• Pavel Procházka, Ph.D.
• Anna Kurowská
• Prof. Jan Čechal, Ph.D.
• Veronika Stará