Ga interaction with ZnO surfaces: Diffusion and melt-back etching

APPLIED SURFACE SCIENCE

PEJCHAL, T.; BUKVIŠOVÁ, K.; VALLEJOS VARGAS, S.; CITTERBERG, D.; ŠIKOLA, T.; KOLÍBAL, M., 2022: Ga interaction with ZnO surfaces: Diffusion and melt-back etching. APPLIED SURFACE SCIENCE 583, p. 152475 - 6, doi: 10.1016/j.apsusc.2022.152475; FULL TEXT
(WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, NANOSAM, VERIOS, KRATOS-XPS, HELIOS)

Equipment:

• Witec Alpha 300R (WITEC-RAMAN)
• Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
• nanoScanning Auger Microscopy/ Scanning electron microscopy with polarization analysis Scienta Omicron nanoSAM Lab (NANOSAM)
• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 (HELIOS)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC authors:

• Tomáš Pejchal
• Kristýna Bukvišová
• Daniel Citterberg
• Prof. Tomáš Šikola
• Miroslav Kolíbal, Ph.D.