Nature-inspired parylene/SiO2 core-shell micro-nano pillars: Effect of topography and surface chemistry

Liu, X.; Fohlerová, Z.; Gablech, I.; Pumera, M.; Neužil, P., 2024: . APPLIED MATERIALS TODAY 37, doi: 10.1016/j.apmt.2024.102117; FULL TEXT
(RIE-FLUORINE, DRIE, PARYLENE-SCS, XEF2)

Equipment:

• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• SCS Parylene Deposition System (PARYLENE-SCS)
• XeF2 Etching of Silicon (XEF2)

Research Groups:

• Future Energy and Innovation
• Bioelectronics Materials and Devices
• CF: CEITEC Nano

CEITEC authors:

• Prof. Martin Pumera, Ph.D.
• Prof. Pavel Neužil
• Imrich Gablech, Ph.D.