Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

BABOCKÝ, J.; DVOŘÁK, P.; LIGMAJER, F.; HRTOŇ, M.; ŠIKOLA, T.; BOK, J.; FIALA, J., 2016: Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 34(6), p. 06K801-1 - 4, doi: 10.1116/1.4966959; FULL TEXT
(MIRA-EBL)

Vybavení:

• Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)

Výzkumné skupiny:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC autoři:

• Petr Viewegh, Ph.D.
• Filip Ligmajer, Ph.D.
• Prof. Tomáš Šikola
• Martin Hrtoň