Downsizing the Channel Length of Vertical Organic Electrochemical Transistors

ACS APPL MATER INTER

BRODSKÝ, J.; GABLECH, I.; MIGLIACCIO, L.; HAVLÍČEK, M.; DONAHUE, M.; GLOWACKI, E., 2023: Downsizing the Channel Length of Vertical Organic Electrochemical Transistors. ACS APPL MATER INTER 15(22), p. 27002 - 8, doi: 10.1021/acsami.3c02049; FULL TEXT
(SUSS-MA8, EVAPORATOR, SCIA, PARYLENE-SCS, RIE-FLUORINE, MIRA-EBL, DEKTAK, ICON-SPM)

Equipment:

• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• Electron beam evaporator BESTEC (EVAPORATOR)
• Ion beam etching Scia Systems Coat 200 (SCIA)
• SCS Parylene Deposition System (PARYLENE-SCS)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)
• Mechanical profilometer Bruker Dektak XT (DEKTAK)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• Bioelectronics Materials and Devices
• CF: CEITEC Nano

CEITEC authors:

• Ludovico Migliaccio, Ph.D.
• Dr. Marek Havlíček
• Prof. Eric Daniel Glowacki, Ph.D.
• Mary Donahue
• Jan Brodský