
Understanding the Effect of Electron Irradiation on WS2 Nanotube Devices to Improve Prototyping Routines
ACS APPLIED ELECTRONIC MATERIALS
KOVAŘÍK, M.; CITTERBERG, D.; PAIVA DE ARAÚJO, E.; ŠIKOLA, T.; KOLÍBAL, M., 2024: Understanding the Effect of Electron Irradiation on WS2 Nanotube Devices to Improve Prototyping Routines. ACS APPLIED ELECTRONIC MATERIALS 6(12), p. 8776 - 7, doi: 10.1021/acsaelm.4c01450; FULL TEXT
(ALD, MIRA-EBL, EVAPORATOR, MPS150, KEITHLEY-4200, LYRA, LITESCOPE-LYRA, WITEC-RAMAN, WIRE-BONDER)
Equipment:
- Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
- Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)
- Electron beam evaporator BESTEC (EVAPORATOR)
- 4-probe station Cascade Microtech MPS 150 (MPS150)
- Keithley 4200-SCS Parameter Analyzer (KEITHLEY-4200)
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
- LiteScope 1.0 (LITESCOPE-LYRA)
- Witec Alpha 300R (WITEC-RAMAN)
- Wire bonder TPT HB 16 (WIRE-BONDER)
Research Groups:
CEITEC authors: