Gecko mimicking surfaces

Master´s Thesis

Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
(SUSS-RCD8, SUSS-MA8, DWL, DRIE, ALD, RIE-FLUORINE, PARYLENE-SCS, XEF2, LYRA, ICON-SPM)

Equipment:

• Resist coating and development system SÜSS MicroTec RCD8 (SUSS-RCD8)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• SCS Parylene Deposition System (PARYLENE-SCS)
• XeF2 Etching of Silicon (XEF2)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Peter Fecko