Characterization of graphene elecrical properties on MEMS structures

Bachelor´s thesis

Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
(MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)

Equipment:

• 4-probe station Cascade Microtech MPS 150 (MPS150)
• Witec Alpha 300R (WITEC-RAMAN)
• Electron beam evaporator BESTEC (EVAPORATOR)
• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (PECVD)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• RIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100 (RIE-CHLORINE)
• Resist stripper Diener electronic NANO Plasma cleaner (DIENER)
• Ion beam etching Scia Systems Coat 200 (SCIA)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Jan Brodský